六甲基二硅氧烷与几种环氧硅烷组成的二元体系的密度与折光率研究  

The Density and Refractive Index of Hexamethyldisiloxane with Four Kinds of Organosilicon Compounds

作　　者：吕叶红 栾文耕 许景 张伟伟 董红[1,3] 瞿志荣 伍川[1,3] LYU Yehong;LUAN Wengeng;XU Jing;ZHANG Weiwei;DONG Hong;QU Zhirong;WU Chuan(Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education,Hangzhou Normal University,Hangzhou 311121,China;The Senior High School Attached to Jining College,Jining 272000,China;Collaborative Innovation Center for the Manufacture of Fluorine and Silicone Fine Chemicals and Materials,Hangzhou 311121,China)

机构地区：[1]杭州师范大学有机硅化学及材料技术教育部重点实验室,浙江杭州311121 [2]济宁学院附属高级中学,山东济宁272000 [3]氟硅精细化学品与材料制造协同创新中心,浙江杭州311121

出　　处：《杭州师范大学学报（自然科学版）》2019年第5期458-469,489,共13页Journal of Hangzhou Normal University(Natural Science Edition)

基　　金：浙江省公益技术应用研究项目(2017C31107)

摘　　要：常压下用Anton Paar DMA4500测定了八甲基环四硅氧烷、四甲基环四硅氧烷、四甲基四乙烯基环四硅氧烷、十甲基环五硅氧烷与六甲基二硅氧烷4个二元混合体系在298.15K、303.15K、308.15K、313.15K及318.15K下全浓度范围内的密度和折光率.4个二元体系的密度值随着温度的升高而降低,随着六甲基二硅氧烷的摩尔分数的增加而降低;4个二元体系的折光率均随着六甲基二硅氧烷的摩尔分数的增加而降低.The density and refractive index were determined for four binary mixtures of hexamethyldisiloxane with octamethylcyclotetrasiloxane,tetramethylcyclotetrasiloxane and tetramethyltetravinylcyclotetrasiloxane,decamethylcyclopentasiloxane at T=(298.15,303.15,308.15,313.15 and 318.15)K and atmospheric pressure using a DMA4500/RXA170 combined system.The density value for the four binary systems decreased with the increasing of temperature and the increasing of the mole fraction of hexamethyldisiloxane.The refractive index of the four binary systems decreased with the increasing of mole fraction of hexamethyldisiloxane.

关 键 词：有机硅化合物 密度 折光率 

分 类 号：O642.42[理学—物理化学] O627.41[理学—化学]