上海光源时间分辨超小角散射线多层膜单色器的设计  

Design of a cryo-cooled double multilayer monochromator in USAXS beamline at SSRF

作　　者：孙小沛 祝万钱[1,2] 徐中民 秦宏亮[1,2] SUN Xiaopei;ZHUWanqian;XU Zhongmin;QIN Hongliang(Shanghai Institute of Applied Physics,Chinese Academy of Sciences,Shanghai 201204,China;Shanghai Advanced Research Institute,Chinese Academy of Sciences,Shanghai 201210,China)

机构地区：[1]中国科学院上海应用物理研究所,上海201204 [2]中国科学院上海高等研究院,上海201210

出　　处：《核技术》2019年第11期1-6,共6页Nuclear Techniques

基　　金：国家自然科学基金联合基金项目(No.U1832172)资助~~

摘　　要：上海光源二期时间分辨超小角散射线站(BL10U2)需要一台多层膜双晶单色器(Double Multilayer Monochromator,DMM),采用Pd/B4C镀层,能量范围覆盖8~15 keV。分析了基于液氮间接冷却条件下多层膜的热变形,介绍了单色器的结构设计。通过对多层膜晶体姿态调节机构引起的误差及四杆运动机构进行分析,设计了一种基于Pivot和轴承调节的Sinbar机构,以期达到单色器稳定性和超高分辨率等要求。[Background] A double multilayer monochromator(DMM) is required in the time-resolved ultra small angle X-ray scattering(USAXS) beamline during Shanghai Synchrotron Radiation Facility(SSRF) phase Ⅱ construction. [Purpose] This study aims at the structure design of DMM for the USAXS beamline of SSRF to satisfy the requirements. [Methods] Based on condition of indirectly cooled by liquid nitrogen, thermal slope error of the multilayer was analyzed and detailed mechanical design of the DMM was introduced. Based on the analysis of the errors caused by the multilayer crystal optics attitude adjustment and the planar four-bar motion mechanism, a Sinbar mechanism based on Pivot and bearing rotating was designed for the DMM. [Results & Conclusion] Basical analysis and calculation results show the design scheme can meet the requirements of monochromator stability and ultra-high angle resolution. At present, the monochromator is manufacturing and its performance will be tested and reported in the future.

关 键 词：同步辐射 单色器 多层膜 液氮冷却 小角X射线散射 

分 类 号：TL99[核科学技术—核技术及应用]