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作 者:李海波[1] 孙林 张宏程 邓正超 LI Hai-bo;SUN Lin;ZHANG Hong-cheng;DENG Zheng-chao(The 55th Research Institute of CETC,Nanjing 210016,China)
机构地区:[1]中国电子科技集团公司第五十五研究所
出 处:《电镀与涂饰》2019年第21期1149-1151,共3页Electroplating & Finishing
摘 要:研究了镀液pH和温度对黑瓷与白瓷外壳化学镀镍镀速、表面形貌和粗糙度的影响.随着镀液pH或温度的升高,黑、白瓷表面化学镀镍速率都增大,镀层表面粗糙度均先减小后增大.在相同条件下,白瓷的镀速高于黑瓷,黑瓷表面镍镀层的表面粗糙度小于白瓷表面的镍镀层.当pH为4.5、温度为80℃时,黑瓷和白瓷表面镍镀层的粗糙度均最小(分别为0.288 nm和0.311 nm),两者的表面都最均匀,缺陷最少.The effects of bath pH and temperature on deposition rate,surface morphology,and roughness of electroless nickel coating on black and white ceramic surfaces were studied.The deposition rates of electroless nickel coating on both ceramic surfaces were increased with the increasing of pH or temperature,while the surface roughness of electroless nickel coating was decreased initially and then increased.The deposition rate and roughness of electroless nickel coating on white ceramic surface were higher than that on black ceramic surface under the same conditions.The nickel coating electrolessly plated at pH 4.5 and temperature 80℃ on both black and white ceramic surfaces had the lowest roughness(0.288 nm and 0.311 nm respectively),most uniformity,and lest defects.
关 键 词:外壳 瓷件 化学镀镍 温度 酸度 粗糙度 沉积速率
分 类 号:TQ153.12[化学工程—电化学工业]
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