3.7～4.8μm中红外带通滤光膜研制  

Development of 3.7-4.8 μm Mid-infrared Band-pass Filter

作　　者：岳威[1] 梁灵芬 王嘉欣 张阔[1] 刘连泽[1] YUE Wei;LIANG Ling-fen;WANG Jia-xin;ZHANG Kuo;LIU Lian-ze(North China Research Institute of Electro-Optics,Beijing 100015,China)

机构地区：[1]华北光电技术研究所

出　　处：《红外》2019年第8期19-23,共5页Infrared

摘　　要：以光学薄膜理论为出发点,系统介绍了3.7~4.8μm带通滤光膜的理论设计与优化、实际生产制备以及成品测试方法。考虑到膜料性能及膜层匹配等问题,分别选用锗和一氧化硅作为高低折射率材料,并以氧化铝作为薄膜基底。确定了滤光膜的基础膜系,并使用Filmaster软件对膜系进行了设计和优化计算。在薄膜蒸镀过程中,根据材料选取合适的镀制工艺。通过温度控制、离子辅助等方法研制出了可靠性与光谱特性皆优的带通滤光膜,并对其光谱特性及膜层质量等进行了测试。根据设计目标修改工艺参数,最终确定可行的工艺流程,从而研制出了符合光学性能设计指标的3.7~4.8μm带通滤光膜。Based on the theory of optical thin film,the theoretical design and optimization,actual production,and finished product testing methods of 3.7-4.8 m band-pass filter are introduced.In view of the problems of film properties and layers matching,Ge and SiO are respectively selected as high and low refractive index materials,and alumina is used as the substrate.The basic membrane system of the filter film is determined,and the membrane system is designed and optimized by using the Filmaster software.In the film evaporation process,a suitable plating process is selected according to the materials.The band-pass filter film with excellent reliability and spectral characteristics is developed by temperature control and ion assistation,and its spectral characteristics and film quality are tested.The process parameters are modified according to the design goals,and the feasible process is finally determined to develop a 3.7-4.8 m band--pass filter conforming to the design requirements for optical performance.

关 键 词：带通滤光膜 中红外 膜系设计 工艺参数 

分 类 号：O484[理学—固体物理]