不同Hf浓度Hf:Ce:Fe:LiNbO3晶体居里温度和抗光损伤性能  

Curie Temperature and Optical Damage Resistance of Hf:Ce:Fe:LiNbO3 Crystals with Different Hf Concentrations

作　　者：谭超 代丽 韩县博 邵瑀 TAN Chao;DAI Li;HAN Xian-bo;SHAO Yu(School of Applied Science,Harbin University of Science and Technology,Harbin 150080,China)

机构地区：[1]哈尔滨理工大学理学院

出　　处：《哈尔滨理工大学学报》2019年第5期134-137,共4页Journal of Harbin University of Science and Technology

基　　金：国家自然科学基金青年基金(51301055);黑龙江省自然科学基金(QC2015061)

摘　　要：通过单晶提拉法生长了一系列不同Hf 4+(2,4,6,8 mol%)离子浓度的Hf:Ce:Fe:LiNbO 3晶体。为了研究不同Hf 4+离子掺杂浓度对Hf:Ce:Fe:LiNbO 3晶体居里温度和抗光损伤能力的影响,采用差热分析仪测量出Hf:Ce:Fe:LiNbO 3晶体差热分析曲线并且分析了晶体的居里温度变化,用光斑畸变法测量了晶体的抗光损伤能力。测试结果表明:当Hf 4+离子掺杂量4 mol%时居里温度提高了20℃并且达到最大值1224℃。随着晶体中Hf 4+离子浓度的增加,晶体的抗光损伤能力提高。掺杂Hf 4+(8 mol%)离子浓度Hf:Ce:Fe:LiNbO 3晶体抗光损伤能力比掺杂Hf 4+(2 mol%)离子浓度Hf:Ce:Fe:LiNbO 3晶体提高了两个数量级。A series of Hf:Ce:Fe:LiNbO3 crystal with variousHf 4+(2,4,6,8 mol%)ion concentration were grown by Czochralski method.In order to study the effect of different doping concentration of Hf 4+ion on curie temperature and optical damage resistibility of Hf:Ce:Fe:LiNbO 3 crystal.Differential thermal analysis curve of Hf:Ce:Fe:LiNbO 3 crystal was meas ured by differential thermal analyzers,and the curie temperature change of the crystal was analyzed.The optical damage resistance of the crystal was measured by the facula distortion method.The experimental results show that the Curie temperature increased by 20℃ and reaches the maximum of 1224℃ when the doping concentration of Hf^4+ ions was 4 mol%.As the concentration of Hf^4+ ions in the crystal increases,the optical damage resistanceability increases.The optical damage resistance ability of the Hf(8 mol%):Ce:Fe:LiNbO3 crystal is two orders of magnitude than Hf(2 mol%):Ce:Fe:LiNbO 3.

关 键 词：铪铈铁铌酸锂晶体 居里温度 抗光损伤能力 

分 类 号：TP333.4[自动化与计算机技术—计算机系统结构]