利用表面等离激元成像检测化学气相沉积法生长石墨烯  

Detection of Chemical Vapor Deposition-Prepared Graphene by Surface Plasmon Polariton Imaging

作　　者：魏茹雪 王延伟 江丽雯 孙旭晴 刘虹遥[1] 王畅 路鑫超[1] 卢维尔 夏洋 黄成军[1] Wei Ruxue;Wang Yanwei;Jiang Liwen;Sun Xuqing;Liu Hongyao;Wang Chang;Lu Xinchao;Lu Weier;Xia Yang;Huang Chengjun(Health Electronics Center,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;Microelectronic Instrument and Equipment Center,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;University of Chinese Academy of Sciences,Beijing 100049,China;Beijing Jiaotong University,Beijing 100044,China;Beijing Research Center of Engineering and Technology of Instrument and Equipment for Microelectronics Fabrication,Beijing 100029,China;Beijing Key Laboratory of Integrated Circuit Test Technology,Beijing 100088,China)

机构地区：[1]中国科学院微电子研究所健康电子研发中心,北京100029 [2]中国科学院大学,北京100029 [3]中国科学院微电子研究所微电子仪器设备研发中心,北京100049 [4]北京交通大学,北京100044 [5]北京市微电子制备仪器设备工程技术研究中心,北京100029 [6]集成电路测试技术北京市重点实验室,北京100088

出　　处：《光学学报》2019年第11期313-318,共6页Acta Optica Sinica

基　　金：国家重点研发计划(2016YFC0900200,2017YFF0107002);国家自然科学基金(61604175);北京市自然科学基金项目(4192063,4182073);广东省科技计划项目(2016A040403086);广州市科技计划项目(201604020005);清华大学环境模拟与污染控制国家重点联合实验室开放课题(18K07ESPCT)

摘　　要：提出一种对化学气相沉积法生长石墨烯缺陷的快速检测方法。利用化学气相沉积法制备石墨烯并将其转移到目标基底上,制备出应用于表面等离激元(SPP)成像的石墨烯-金基底。SPP对界面处折射率变化具有高灵敏度,可以实现石墨烯边缘检测,并且石墨烯表面缺陷会引起SPP作用场的变化,利用SPP泄漏辐射效应将界面处SPP作用场变化传输至远场,使用CCD进行快速成像,可实现对转移后石墨烯的快速成像与检测。该方法检测到石墨烯边缘与表面的形貌信息,并且检测到颗粒污染物,避免了传统的检测方法灵敏度低、速度慢、有损检测等弊端,实现了对石墨烯缺陷的快速、无损检测。A method to quickly detect defects in chemical vapor deposition(CVD)-prepared graphene is proposed. After transferring the graphene prepared by CVD to the target substrate, a graphene-gold substrate is prepared for surface plasmon polariton(SPP) imaging. Since SPP imaging is highly sensitive to the change of refractive index on the interface, it is used for detection of the graphene edge. Furthermore, as the surface defects of the graphene change the distribution of SPP fields, the SPP field distribution transfers to the far-field due to SPP leakage radiation effect, which is quickly imaged by charge-coupled device. Herein, the morphologies of graphene edge and surface, defects, and impurities are detected. This method is an improvement on previous low sensitivity, low speed as well as damage detection of traditional detection method, and it achieves high-sensitivity, high-speed, and nondestructive detection for graphene.

关 键 词：表面光学 单晶石墨烯 表面等离激元成像 缺陷检测 快速无损检测 

分 类 号：O436.2[机械工程—光学工程]