电子束与电阻复合法制备Cu-Ti金属玻璃薄膜及性能测试  

Preparation and performance of Cu-Ti metallic glass film by electron beam and resistance complex method

作　　者：胡青卓[1] 张进军 HU Qingzhuo;ZHANG Jinjun(School of Materials Science and Engineering,Hefei University of Technology,Hefei 230009,China;Office of Academic Affairs,Hefei University of Technology,Hefei 230009,China)

机构地区：[1]合肥工业大学材料科学与工程学院,安徽合肥230009 [2]合肥工业大学教务处,安徽合肥230009

出　　处：《合肥工业大学学报（自然科学版）》2019年第12期1620-1624,共5页Journal of Hefei University of Technology：Natural Science

基　　金：国家自然科学基金青年科学基金资助项目(51801050)

摘　　要：文章采用电子束与电阻复合热蒸发的方法,在衬底盘无冷却水条件下成功制备了Cu-Ti二元金属玻璃薄膜。通过X射线衍射仪(X-ray diffraction, XRD)、差示扫描量热仪(differential scanning calorimetry, DSC)和场发射透射电子显微镜(field emission transmission electron microscope, FE-TEM)表征了该二元合金薄膜的非晶态结构。此外,利用升温XRD方法研究了升温速率对玻璃转变温度和晶化温度的影响作用。另外,在紫外光和可见光辐照下,偏压分别为+0.2 V和-0.2 V时均有光电流响应,结果表明,该方法制备的Cu-Ti金属玻璃薄膜在紫外光和可见光区域具有光电响应特性,且表现出典型的N型光电流特性。In this paper, the Cu-Ti binary metallic glass film was prepared by electron beam and resistance composite thermal evaporation without cooling water condition. The amorphous structure of this binary thin film was characterized by X-ray diffraction(XRD), differential scanning calorimetry(DSC) and field emission transmission electron microscope(FE-TEM). And the effects of the heating rate on glass transition temperature and crystallization temperature were studied by using in situ warming XRD method. In addition, there was photocurrent response when the bias voltage was +0.2 V and-0.2 V and under ultraviolet and visible light irradiation. It is indicated that the Cu-Ti metallic glass thin film prepared by this method has photocurrent response characteristics and it shows typical N-type currents characteristics.

关 键 词：电子束与电阻复合热蒸发 Cu-Ti金属玻璃薄膜 玻璃转变温度 光电流响应 

分 类 号：O756[理学—晶体学]