Fabrication,characterization and optimization of high conductivity and high quality nanocrystalline molybdenum thin films  

作　　者：Anil K.Battu Nanthakishore Makeswaran C.V.Ramana 

机构地区：[1]Center for Advanced Materials Research(CMR),University of Texas at El Paso,El Paso,TX 79968,USA [2]Environmental Molecular Sciences Laboratory(EMSL),Pacific Northwest National Laboratory(PNNL),Richland,WA 99352,USA

出　　处：《Journal of Materials Science & Technology》2019年第11期2734-2741,共8页材料科学技术（英文版）

基　　金：supported financially by the National Science Foundation (NSF) with the NSF-PREM grant#DMR-1827745

摘　　要：The present study investigated the influence of substrate temperature(Ts)and working pressure(P(Ar))on tailoring the properties of nanocrystalline(nc)molybdenum(Mo)films fabricated by radio-frequency magnetron sputtering.The structural,morphological,electrical and optical properties of nc-Mo films were evaluated in detail.The Mo films exhibited(110)orientation with average crystallite size varying from 9 to 22(±1)nm on increasing Ts.Corroborating with structural data,the electrical resistivity decreased from 55μΩcm to 10μΩcm,which is the lowest among all the Mo films.For Mo films deposited under variable P(Ar).the(110)peak intensity decrement coupled with peak broadening on increasing P(Ar).Lower deposition pressure yielded densely packed thin films with superior structural properties along with low resistivity of 15μΩcm.Optimum conditions to produce high quality Mo films with excellent structural,morphological,electrical and optical characteristics for utilization in solar cells as back contact layers were identified.The present study investigated the influence of substrate temperature（Ts） and working pressure(PAr)on tailoring the properties of nanocrystalline（nc） molybdenum（Mo） films fabricated by radio-frequency magnetron sputtering.The structural,morphological,electrical and optical properties of nc-Mo films were evaluated in detail.The Mo films exhibited（110） orientation with average crystallite size varying from 9 to 22（±1） nm on increasing Ts.Corroborating with structural data,the electrical resistivity decreased from 55 μΩ cm to 10 μΩ cm,which is the lowest among all the Mo films.For Mo films deposited under variable PAr.the（110） peak intensity decrement coupled with peak broadening on increasing PAr.Lower deposition pressure yielded densely packed thin films with superior structural properties along with low resistivity of 15 μΩ cm.Optimum conditions to produce high quality Mo films with excellent structural,morphological,electrical and optical characteristics for utilization in solar cells as back contact layers were identified.

关 键 词：MOLYBDENUM Thin films Microstructure Electrical characteristics Optical properties Solar cells 

分 类 号：TM914.4[电气工程—电力电子与电力传动] TB383.2[一般工业技术—材料科学与工程]