Biomimetic Moth-eye Anti-reflective Poly-(methyl methacrylate)Nanostructural Coating  

作　　者：Hongbo Xu Liuting Gong Shoucai Zhang Renping Ma Lei Pan Jiupeng Zhao Yao Li 

机构地区：[1]MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and Storage,School of Chemistry and Chemical Engineering,Harbin Institute of Technology,Harbin 150001,China [2]Beijing Institute of Space Mechanics and Electricity,Beijing 100094,China [3]Beijing Vocational College of Labour and Social Security,Beijing 102200,China [4]Center for Composite Material,Harbin Institute of Technology,Harbin 150001,China

出　　处：《Journal of Bionic Engineering》2019年第6期1030-1038,共9页仿生工程学报（英文版）

基　　金：This work was supported by National Natural Science Foundation of China(No.51572058,51502057,51702068);National Key Research&Development Program(2016YFB0303903,2016YFE0201600);the International Science&Technology Cooperation Program of China(2013DFR10630,2015DFE52770);China Postdoctoral Science Foundation(No.2016M601427);Heilongjiang Province Postdoctoral Science Foundation(No.LBH-Z16080);Foundation of Equipment Development Department(6220914010901).

摘　　要：This study reports a simple imprinting method for the fabrication of biomimetic moth-eye antireflective polymethyl methacrylate(PMMA)nanostructures on the surface of the substrate.The antireflection structured silicon was obtained by Reactive Ion Etching(RIE)method.By using the antireflection structured silicon substrate as the imprinting stamp,the biomimetic moth-eye polymer structures showed tapered holes,whose depth and periodicity were around 780 nm and 580 nm,respectively.The reflectance of the resulting PMMA structures was reduced from 10% to less than 1% in the wavelength range from 300 nm to 1600 nm.This simple methodology can be scaled up via self-loading and nanoimprinting,which may have a promising application in optoelectronic devices and solar cells.

关 键 词：NANOIMPRINTING sub-wavelength structure ANTIREFLECTIVE biomimetic moth-eye 

分 类 号：O63[理学—高分子化学]