钨纳米颗粒填充法制作X射线吸收光栅  

Fabrication of X-ray Absorption Gratings by Filling Tungsten Nanoparticles

作　　者：李乔飞 许桂雯[1] 李冀[1] 黄建衡[1] 雷耀虎[1] LI Qiaofei;XU Guiwen;LI Ji;HUANG Jianheng;LEI Yaohu(Key Lab.of Optoelectronic Devices and Systems of the Ministry of Education and Guangdong Province,College of Physics and Optoelectronic Engin.,Shenzhen University,Shenzhen 518060,CHN)

机构地区：[1]深圳大学物理与光电工程学院光电子器件与系统(教育部/广东省)重点实验室

出　　处：《半导体光电》2019年第6期786-788,890,共4页Semiconductor Optoelectronics

基　　金：国家自然科学基金项目(61227802,61405120,61605119,61571305,11674232);深圳科创委项目(JCYJ20170302142617703)

摘　　要：提出一种新颖、可避免高温过程的大面积吸收光栅制作方法,使用钨纳米粒子作为X射线吸收材料,利用有机溶剂和乳化剂作为吸收材料的载体,在负压下将它们填充到周期为42μm、深度为150μm的光栅结构中。此外,与通过微铸造技术制作的相同结构铋块体吸收光栅相比较,得到的X射线投影吸收对比度表明,钨纳米颗粒对X射线吸收性能低约15%,但纳米颗粒填充法可显著降低吸收光栅的制作成本,并利于实现大面积制作。A novel fabrication method of large-area absorption gratings was proposed to avoid the high temperature process.Tungsten nanoparticles were used as X-ray absorbing materials,and organic solvents and emulsifiers were used as carriers to bring these absorbing materials into grating structures with the period of 42μm and the depth of 150μm under a negative pressure.Moreover,by comparing X-ray absorbing grating of the bismuth-based bulk with that of the same structure fabricated by micro-casting technology,it is shown that the bismuth nanoparticles have about 15% decrease in X-ray absorbing.

关 键 词：X射线 相衬成像 吸收光栅 纳米颗粒 钨 

分 类 号：O647.5[理学—物理化学]