XPS研究金属铀氧化反应动力学  

Uranium Oxidation Kinetics: An X-Ray Photoelectron Spectroscopy Study

作　　者：孙超伦 王晓方[1] 潘启发 胡殷[1] 刘柯钊[1] Sun Chaolun;Wang Xiaofang;Pan Qifa;Hu Yin;Liu Kezhao(Science and Technology on Surface Physics and Chemistry Laboratory,Mianyang 621908,China)

机构地区：[1]表面物理与化学重点实验室

出　　处：《真空科学与技术学报》2019年第12期1154-1156,共3页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金委员会与中国工程物理研究院联合基金重点项目(No.U1630250)

摘　　要：X射线光电子能谱技术被广泛用于研究材料表面研究。XPS谱图能够准确及时反映101 nm深度内材料表面元素组成与结构信息。利用激发电子的穿透特性,XPS能够作为半定量的研究手段。本文利用XPS测厚技术研究了金属铀在5×10^-6 Pa氧气压力、温度低于413 K条件下的氧化反应动力学行为,在该研究条件下金属铀初始氧化遵循抛物线规律,反应活化能为23.9 kJ/mol。The initial oxidation behavior of uranium surfaces,in the ultra-high vacuum(UHV) chamber of ESCALAB 250 at an oxygen partial pressure of 5×10^-6 Pa and a temperature below 413 K,was investigated in-situ with X-ray photoelectron spectroscopy,which is capable of semi-quantitatively evaluating in real-time the thickness growth of uranium oxide because of the penetration characteristic of the excitation electron. The results show that the thickness of uranium oxides depended parabolically on the oxidation time,indicating that the oxygen diffusion through uranium oxide layer significantly affected the oxidation rate of uranium. As expected,the oxidation rate increased with an increase of temperature.In addition,the oxidation activation energy was calculated to be 23.9 kJ/mol.

关 键 词：金属铀 X射线光电子能谱 低压氧化 活化能 

分 类 号：TG172[金属学及工艺—金属表面处理]