高性能多功能介质二次电子发射特性研究平台  

High-performance multifunctional apparatus for studying secondary electron emission characteristics of dielectric

作　　者：何鋆[1] 杨晶[1] 苗光辉 张娜[1] 崔万照[1] He Yun;Yang Jing;Miao Guanghui;Zhang Na;Cui Wanzhao(National Key Laboratory of Science and Technology on Space Microwave,China Academy of Space Technology(Xi’an),Xi’an 710000,China)

机构地区：[1]中国空间技术研究院(西安分院)空间微波技术重点实验室

出　　处：《强激光与粒子束》2020年第3期69-73,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目和空间微波技术重点实验室基金项目(U1537211,6142411191104,6142411191103,6142411181105,61701394)

摘　　要：介绍了一套高性能多功能介质二次电子发射特性研究平台和介质材料二次电子产额脉冲测量方法。该平台配备有三层栅网结构的收集器和30 eV^30 keV宽能量范围的电子枪,可在10-8 Pa超高真空下测量介质材料的二次电子发射特性,并具备XPS能谱分析、加热和氩离子溅射清洗原位处理分析功能。给出了测得的金和氧化铝材料的二次电子电流脉冲,通过判断电流脉冲波形随时间以及照射次数的变化,获得了介质材料带电饱和时间及材料厚度对带电量的影响。The paper introduces a high-performance multifunctional apparatus for studying secondary electron emission characteristics of dielectric. The apparatus is equipped with a collector containing three grids and a 30 eV-30 keV electron gun, the secondary electron emission characteristics of dielectric can be measured under ultra-high vacuum, and in-situ XPS analysis spectrometer, heating and argon ion sputtering can also be performed. The paper also introduces the measurement of secondary electron yield by pulse method, gives the measured secondary electron current pulse of gold and Al2O3, presents the charging saturation time and influence of the thickness of dielectric on the charge amount obtained by judging the change of the current pulse waveform with time and the number of irradiations.

关 键 词：二次电子 二次电子产额 脉冲法 真空电子与技术 

分 类 号：O462.2[理学—电子物理学]