Near-infrared carbon-implanted waveguides in Tb^3+doped aluminum borosilicate glasses  

作　　者：Yue WANG Jiaxin ZHAO Qifeng ZHU Jianping SHEN Zhongyue WANG Haitao GUO Chunxiao LIU 

机构地区：[1]College of Electronic and Optical Engineering,Nanjing University of Post and Telecommunications,Nanjing 210023,China [2]State Key Laboratory of Transient Optics and Photonics,Xi'an Institute of Optics and Precision Mechanics,Chinese Academy of Sciences(CAS),Xi'an 710119,China

出　　处：《Frontiers of Optoelectronics》2019年第4期392-396,共5页光电子前沿（英文版）

基　　金：This work was financially supported by the National Natural Science Foundation of China(Grant Nos.11405041,51502144 and 61475189).

摘　　要：Ion implantation has played a unique role in the fabrication of optical waveguide devices.Tb'-doped aluminum borosilicate(TDAB)glass has been considered as an important magneto-optical material.In this work,near-infrared waveguides have been manufactured by the(5.5+6.0)MeV C^3+ion implantation with doses of(4.0+8.0)×10^13 ions·cm^-2 in the TDAB glass.The modes propagated in the TDAB glass waveguide were recorded by a prism-coupling system.The finite-difference beam propagation method(FD-BPM)was carried out to simulate the guiding characteristics of the TDAB glass waveguide.The TDAB glass waveguide allows the light propagation with a single-mode at 1.539μm and can serve as a potential candidate for future waveguide isolators.

关 键 词：Tb^3+-doped aluminum borosilicate(TDAB)glass optical waveguide ion implantation 

分 类 号：TN2[电子电信—物理电子学]