HIP法制备CuCr触头的真空电击穿特性  

Vacuum breakdown properties of CuCr contacts prepared by hot isostatic pressing

作　　者：郭阳阳 王发展[1] 王永滨 吕勤良 Guo Yangyang;Wang Fazhan;Wang Yongbin;Lu Qinliang(School of Mechanical and Electrical Engineering,Xi’an University of Architecture and Technology,Xi'an Shaanxi 710055,China)

机构地区：[1]西安建筑科技大学机电工程学院,陕西西安710055

出　　处：《金属热处理》2020年第2期181-185,共5页Heat Treatment of Metals

基　　金：株洲冶炼集团股份有限公司产学研重点项目(2040201255)。

摘　　要：采用热等静压(HIP)固相烧结法制备了近乎完全致密、低氧、氮含量的CuCr合金材料,研究了在不同烧结温度下制备CuCr合金的Cr相颗粒度、电击穿场强及击穿区域,给出了CuCr合金Cr相粒子半径与击穿场强的关系式。结果表明:随着HIP烧结温度的上升,CuCr触头材料的Cr相颗粒度也将逐渐增大,导致真空电击穿场强减小,与此同时真空电击穿烧蚀面积增大,烧蚀坑深度逐步加深。CuCr alloy materials with a nearly full density and low-oxygen nitrogen content were prepared by hot isostatic pressing( HIP). The Cr phase granularity,break down field strength and break down area were systemically investigated for the CuCr alloys under different sintering temperatures. The relationship between the Cr phase particle radius and the breakdown field strength of CuCr alloy was explored.The results indicate that on a certain range as the HIP sintering temperature increases,the particle size of the CuCr alloy materials gradually increases. Then the larger the particle radius of CuCr alloy Cr phase,the smaller the vacuum electric breakdown field strength will be.Finally,when the particle radius of CuCr alloy Cr phase increases,the break down ablation area tends to expand,and the ablation pit also slightly deepens.

关 键 词：CUCR合金 热等静压 烧结温度 粒子半径 击穿场强 

分 类 号：TG144[一般工业技术—材料科学与工程]