六价铬镀铬添加剂作用原理  

Mechanism of Additives for Hexavalent Chromium Plating

作　　者：吴双成 储荣邦 WU Shuangcheng;CHU Rongbang(Gansu Gaolan Victory Machinery Co.Ltd.,Lanzhou 730299,China;Nanjing,Nanjing 210013,China)

机构地区：[1]甘肃皋兰县胜利机械有限公司,甘肃兰州730299 [2]南京,江苏南京210013

出　　处：《电镀与精饰》2020年第2期26-32,共7页Plating & Finishing

摘　　要：根据硫酸与铬酸反应生成硫酸铬酰的理论,解释了电流密度、镀液温度等影响镀铬电流效率的因素。对各镀铬添加剂的作用原理,如有机磺酸和硒酸,卤化物及卤酸盐,羧酸类、同多酸和杂多酸,稀土类、羟基羧酸等进行了详细介绍。According to the theory that sulfuric acid reacting with chromic acid to form chromium sulfate acyl,the factors influencing the efficiency of chrome-plating current,such as current density and bath temperature,were explained. And the action mechanisms of various chromium plating additives,such as organic sulfonic acid and selenic acid,halide and halate,carboxylic acid,homopoly acid and heteropoly acid,rare earth,hydroxyl carboxylic acid,were described in detail.

关 键 词：六价铬 镀铬添加剂 电流效率 

分 类 号：TQ153.11[化学工程—电化学工业]