阴极电弧离子镀膜技术的进步  

Advances in Cathode Arc Ion Plating Technology

作　　者：王福贞[1] WANG Fuzhen(Beijing Union University,Beijing 100102,China)

机构地区：[1]北京联合大学,北京100102

出　　处：《真空与低温》2020年第2期87-95,共9页Vacuum and Cryogenics

摘　　要：阴极电弧离子镀膜技术是国内外沉积工模具硬质膜层的主要技术。在高新技术产品和高端制造业需求的推动下,阴极电弧离子镀膜技术得到了长足的进步。本文介绍了阴极电弧离子镀膜技术的原理和特点,重点分析了阴极电弧源、硬质膜层性能和工件清洗技术等方面的进展,并对未来的发展进行了展望。The technology of cathode arc ion plating is the main technology of hard coating for deposition tools.With the development of high-tech products and high-end manufacturing industry,cathode arc ion plating technology has been developed.The principle,characteristics and technical progress of various new cathode arc ion plating technologies are introduced.And the future development is prospected.

关 键 词：阴极电弧离子镀 冷场致弧光放电 硬质膜层 弧光放电氩离子清洗技术 

分 类 号：O484[理学—固体物理]