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作 者:夏翥杰 张治国 王红莉 苏一凡 唐鹏 林松盛 代明江 石倩 XIA Zhu-jie;ZHANG Zhi-guo;WANG Hong-li;SU Yi-fan;TANG Peng;LIN Song-sheng;DAI Jiang-ming;SHI Qianb(Institute of Advanced Wear and Corrosion Resistant and Functional Materals,Jinan University,Guangzhou 510632,China;National Engineering Laboratory for Modern Materials Surface Engineering Technology,The Key Lab Guangdong for Modern Surface Engineering,Guangdong Institute of New Materials,Guangzhou 510651,China)
机构地区:[1]暨南大学,先进耐磨蚀及功能材料研究院,广东广州510632 [2]广东省新材料研究所,现代表面工程技术国家工程实验室,广东省现代表面工程技术重点实验室,广东广州510651
出 处:《真空》2020年第2期47-52,共6页Vacuum
基 金:广东省科学院科技创新发展专项(2017GDASCX-0202,2019GDASYL-0402004);广东省科技计划项目(2017A070701027);广州市科技计划项目(201607010091);省属科研机构(广东省工业技术研究院)创新能力建设项目(2014B070705007);广东省科学院科技创新发展专项(2018GDASCX-011)。
摘 要:采用直流反应磁控溅射方法在室温下制备WO3薄膜。研究溅射功率对WO3薄膜结构及电致变色性能的影响规律,考察退火后WO3薄膜的结构演变及电致变色性能变化。结果表明溅射功率为270W时薄膜表现出较好的电致变色性能,其调制幅度达78.5%,着色时间为9s,褪色时间为3.2s。将该功率下制备的WO3薄膜进行退火处理,其结构由非晶态转变为晶态,但调制幅度、响应时间特性都发生一定程度的退化。非晶态WO3薄膜相比晶态结构具有更快的响应时间和更宽的调制幅度,但晶态薄膜具有更好的循环稳定性。The WO3 thin film was prepared at room temperature by using a DC reactive magnetron sputtering method.The effects of sputtering power on the structure and electrochromic properties of the WO3 thin films were investigated.The structural evolution and electrochromic properties of WO3 films after annealing were investigated.The results show that the WO3 film exhibits better electrochromic performance at a sputtering power of 270 W,with a modulation amplitude of 78.5%,coloring time of 9 s and fading time of 3.2 s.The WO3 film prepared at this power is annealed,and its structure changes from amorphous to crystalline,but the modulation amplitude and response time characteristics are degraded to some extent.It is known that the amorphous WO3 film has faster response time and wider modulation amplitude than the crystalline structure,but the crystalline film has better cycle stability.
分 类 号:TB34[一般工业技术—材料科学与工程] TB43
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