三氯氢硅副产物氯硅烷废液的处理方法研究  

Treatment of Waste Liquid of Chlorosilane as Byproducts of Trichlorosilane

作　　者：刘蕊 杨素芬 谷利敏 时智宝 汪敬恒 LIU Rui;YANG Sufen;GU Limin;SHI Zhibao;WANG Jingheng(Henan Chemical Industry Research Institute Co.Ltd.,Zhengzhou 450052,China)

机构地区：[1]河南省化工研究所有限责任公司,郑州450052

出　　处：《河南科学》2020年第3期423-428,共6页Henan Science

基　　金：河南省科技攻关项目(182102311004)。

摘　　要：以三氯氢硅和多晶硅生产中精馏塔底排出的重组分副产物--四氯化硅和高聚氯硅烷的混合物为原料,采用气相水解法制备白炭黑新工艺.考察了气化温度、水蒸气和氯硅烷混合物的流量、流量比等因素对产物理化性能的影响.结果表明,较优工艺条件为气化温度155℃,氯硅烷混合物通气流量120 mL/min,水蒸气和氯硅烷混合物的流量比值4.1.该工艺条件下所得产物为无定形结构的超细白炭黑粉末,其DBP吸收值2.49 mL/g,比表面积122.49 m^2/g,二氧化硅含量(干基)99.7%,粒径d50为10.48μm.In this paper,a new process of preparing silica hydrated by gas-phase hydrolysis was adopted by using the mixture of silicon tetrachloride and polychlorosilane which is the by-products discharged from the bottom of rectifying tower in the production of trichlorosilane and polysilicon. Several reaction factors such as the gasification temperature,flow rate and flow rate ratio of water vapor and chlorosilane mixture on the physical and chemical properties of the product were investigated. The optimal process conditions were confirmed as follows:gasification temperature 155 ℃,ventilation flow rate of chlorosilane mixture 120 mL/min,flow rate ratio of water vapor to chlorosilane mixture 4.1.Under the process conditions,the obtained product was amorphous ultrafine silica powder,with DBP absorption value of2.49 m L/g,specific surface area of 122.49 m2/g,silica content(dry basis)of 99.70%,and particle size(d50)of 10.48 μm.

关 键 词：四氯化硅 高聚氯硅烷 气相水解法 白炭黑 

分 类 号：X781.5[环境科学与工程—环境工程]