820nm光吸收曲线技术在逆境条件下叶片光系统Ⅰ性能研究中的应用  

Application of Light Absorbance at 820 nm in Study of PhotosystemⅠ in Leaves under Adversity Stress

作　　者：王仁杰 蒋燚[1] 朱凡[2] 唐正 刘雄盛[1] 姜英[1] 王勇[1] Wang Renjie;Jiang Yi;Zhu Fan;Tang Zheng;Liu Xiongsheng;Jiang Ying;Wang Yong(Guangxi Forestry Research Institute,Nanning,Guangxi 530002,China;College of Life Science and Technology,Central South University of Forestry&Technology,Changsha,Hunan 410004,China)

机构地区：[1]广西壮族自治区林业科学研究院,广西南宁530002 [2]中南林业科技大学生命科学与技术学院,湖南长沙410004

出　　处：《广西林业科学》2020年第1期152-155,共4页Guangxi Forestry Science

基　　金：国家自然科学基金项目(41503081);广西林业科技推广示范项目(gl2017kt13)。

摘　　要：光合作用是植物生长发育的基础,在逆境条件尤其是低温和弱光等胁迫下,叶片光系统Ⅰ(PSⅠ)性能下降引起越来越多的关注。820 nm光吸收曲线技术可以用来检测发生在PSⅠ的原初光化学反应。本文总结了利用820 nm光吸收曲线技术测定PSⅠ的光化学效率、环式电子传递能力和能量分配的基本原理,及在逆境条件下的研究成果,以期为820 nm光吸收曲线技术在其它条件下对PSⅠ性能影响提供理论和技术支撑。Photosynthesis was basis of plant growth and development. In recent years, increasing attention was drawn to decrease of photosystemⅠ( PSⅠ) in the field of adversity stresses, especially in low temperature and weak light stress. Application of light absorbance at 820 nm could be used to detect primary photochemical reactions that occurred in PSⅠ. Basic principles of measuring photochemical efficiency, cyclic electron transfer capacity and energy distribution of PSⅠby light absorbance at 820 nm and research results under adversity stresses were summarized in order to provide theoretical and technical support for influence of light absorbance at 820 nm on PSⅠperformance under other conditions.

关 键 词：820 nm光吸收 光系统Ⅰ(PSⅠ) 光化学效率 电子传递 能量分配 

分 类 号：Q945.78[生物学—植物学]