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作 者:路萍 李莹[1] 李海山 连增斌 LU Ping;LI Ying;LI Haishan;LIAN Zengbin(Faculty of Mechanical and Electrical Engineering,Kunming Universiy of Science and Technology,Kunming 650504,Yunnan,China;Kunming Ruifeng Printing Co,Ltd,Kunming 650217,Yunnan,China)
机构地区:[1]昆明理工大学机电工程学院,云南昆明650504 [2]昆明瑞丰印刷有限公司,云南昆明650217
出 处:《化学研究》2019年第6期599-605,共7页Chemical Research
基 金:国家自然科学基金地区科学基金项目(2196080169).
摘 要:利用顶空-气相色谱串联质谱(HS-GC/MS)技术建立光油溶剂残留控制物的测定方法,对比、分析光油种类、印版清洗剂、印版线数、印刷速度、干燥温度等工艺参数对上光工序中挥发性有机物(苯及苯系物、溶剂残留、溶剂杂质)的影响及变化.经仪器参数优化,各组分相关系数(R^2)均≥0.9982;回收率≥80.4%,相对标准偏差(RSD)<5.8%(n=6).结果表明,水性光油较珠光油、UV光油溶剂残留量最少,选择纯水和正丙酯溶液结合清洗印版引入溶剂残留量最小,随印版线数增加溶剂残留量不断增大,当印刷速度达160 m/min光油附着力最佳,溶剂残留量较少,干燥温度为120℃光油表现出彻干性,溶剂得到充分挥发.Determination of varnish residue control by headspace-gas chromatography tandem mass spectrometry(HS-GC/MS), the effects of process parameters such as varnish type, plate cleaning agent, plate number, printing speed and drying temperature on volatile organic compounds(benzene and benzene, solvent residues, solvent impurities) in the glazing process were analyzed According to the optimization of instrument parameters, the correlation coefficient(R^2) of each component was ≥0.998 2;the recovery rate was ≥80.4%, and the relative standard deviation(RSD) was <5.8%(n=6). The results show that residual amount of water-based varnish is the least compared with pearl varnish and UV varnish. The choice of pure water and n-propyl ester solution combined with cleaning plate introduces the minimum solvent residue, and the solvent residue increases with the number of printing plates. The varnish with the speed of 160 m/min has the best adhesion, and the solvent residual amount is small. The varnish shows the dryness, and the solvent is fully volatilized when the drying temperature reach 120 ℃.
关 键 词:顶空-气相色谱/质谱法 光油 上光工艺 挥发性有机物 溶剂残留
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