钼反萃取界面污物成因分析及消除研究  

Causes and Reduction of Interfacial Curd in Molybdenum Loaded Organic Stripping

作　　者：张永明[1] 牛玉清[1] 支梅峰 周志全[1] 曹令华[1] 王皓[1] ZHANG Yongming;NIU Yuqing;ZHI Meifeng;ZHOU Zhiquan;CAO Linghua;WANG Hao(Beijing Research Institute of Chemical Engineering and Metallurgy,CNNC,Beijing 101149,China)

机构地区：[1]核工业北京化工冶金研究院,北京101149

出　　处：《铀矿冶》2020年第2期87-91,共5页Uranium Mining and Metallurgy

摘　　要：考察了某铀钼分离体系中负载钼有机相的反萃取界面污物的成分,分析了界面污物的形成过程和成因,探索了消除该钼反萃取界面污物的方法。试验研究表明:界面污物的形成机制复杂,其形成过程受萃原液中硅、磷、砷等杂质含量高低的影响;通过对反萃取工艺和设备的改进可以明显降低界面污物的产生量。The causes of interfacial crud in the molybdenum loaded organic stripping of a uranium molybdenum separation system were discussed, the composition of the interfacial crud was determined, and the formation process of the interfacial crud was analyzed, and the method of reducing the interfacial crud has been tested. The results suggest that the formation mechanism of interfacial crud is complicated, and the formation process is influenced by the content of impurities such as silicon, phosphorus and arsenic in the pregnant leaching solution, and the improvement of the stripping process and equipment can significantly reduce the amount of interfacial crud generated.

关 键 词：反萃取 界面污物 钼 氧化 

分 类 号：TL212.12[核科学技术—核燃料循环与材料]