光电直读光谱法测定金属材料中杂质的防污染措施  

Contamination prevention measures for determination of impurities in metal materials by photoelectric direct reading spectrometry

作　　者：邹德霜[1] 代以春[1] 田伦富[1] Zou Deshuang;Dai Yichun;Tian Lunfu(Institute of Mechanical Manufacturing Technology,Chinese Academy of Engineering Physics,Mianyang 621900,China)

机构地区：[1]中国工程物理研究院机械制造工艺研究所,绵阳621900

出　　处：《分析仪器》2020年第2期77-81,共5页Analytical Instrumentation

摘　　要：光电直读光谱法测定杂质时,制样、测试过程中产生的污染会导致仪器描迹、仪器校准、试样测试数据重复性差,导致测定结果不准确。本文分析了光电直读发射光谱法测定杂质过程中污染产生的影响、判定、来源,针对不同的污染情况,采取了相应的物理、化学清洁、连续测试防污染措施。试验结果表明,这些防污染措施是有效的。The contamination during samples preparation and test will lead to inaccurate measurement results.In this paper,the influence,identification,sources of contamination are reported.The suitable prevention measures are carried out including physical means,chemical means,continuous excitation contraposing the sources of contamination.The measures are effective.

关 键 词：光电直读光谱法 污染 措施 

分 类 号：TG115.33[金属学及工艺—物理冶金]