氯化物三价铬镀铬槽持续出现沉淀故障的处理  

Countermeasures for malfunction of continuous precipitation occurred during trivalent chromium electroplating in a chloride-based electrolyte

作　　者：周爱军 郭崇武[2] ZHOU Aijun;GUO Chongwu(Foshan City Nanhai Gaoyimei Environmental Protection Industry Co.,Ltd.,Foshan 528244,China)

机构地区：[1]佛山市南海高益美环保实业有限公司,广东佛山528244 [2]广州超邦化工有限公司,广东广州510460

出　　处：《电镀与涂饰》2020年第8期479-480,共2页Electroplating & Finishing

摘　　要：氯化物三价铬镀铬槽中盐酸加入量不够时,碱式硫酸铬分子中的氢氧根不能与盐酸充分反应,导致在生产中三价铬水解,持续生成沉淀物。向镀槽中加浓盐酸10 mL/L调节pH至1.8,24 h后镀液pH升高至2.73,镀槽中没有出现沉淀物,恢复正常生产。The hydroxyl in basic chromium sulfate molecule did not adequately react with the acid due to the insufficient dosage of hydrochloric acid in a trivalent chromium electroplating bath with chloride as supporting electrolyte,resulting in the continuous formation of precipitates by hydrolysis of trivalent chromium ions.10 mL/L of concentrated hydrochloric acid was added to the electroplating bath to adjust its pH to 1.8,which rose to 2.73 after 24 hours.There was no precipitate in the electroplating bath,and the production returned to normal.

关 键 词：三价铬镀铬 碱式硫酸铬 水解 沉淀 故障处理 

分 类 号：TQ153.11[化学工程—电化学工业]