Kinetic simulation of an electronegative plasma with a cut-off distribution and modified Bohm criterion  

作　　者：Suresh BASNET Raju KHANAL 

机构地区：[1]Central Department of Physics,Tribhuvan University,Kirtipur,Kathmandu 44613,Nepal

出　　处：《Plasma Science and Technology》2020年第4期33-39,共7页等离子体科学和技术（英文版）

基　　金：Suresh Basnet would like to acknowledge the University Grants Commission,Nepal for the PhD fellowship.

摘　　要：A kinetic simulation model has been employed to study the properties of an electronegative magnetized plasma sheath assuming the cut-off distribution of electrons and negative ions.The fundamental kinetic Bohm condition for the electronegative magnetized plasma has paramount importance for the formation of a stationary plasma sheath near the material wall.The presence of an oblique magnetic field in an electronegative plasma affects the ion distribution at the plasma injection side and at the wall.The temperature profile of negative charged particles has a non-uniform distribution,which determines the energy flow towards the wall.

关 键 词：BOHM CONDITION KINETIC simulation plasma–wall interaction electronegative PLASMA 

分 类 号：O53[理学—等离子体物理]