Numerical accuracy and convergence with EMC3-EIRENE  

作　　者：Kristel GHOOS Heinke FRERICHS Wouter DEKEYSER Giovanni SAMAEY Martine BAELMANS 

机构地区：[1]KU Leuven,Department of Mechanical Engineering,B-3001,Leuven,Belgium [2]University of Wisconsin Madison,Department of Engineering Physics,WI 53706,United States of America [3]KU Leuven,Department of Computer Science,B-3001,Leuven,Belgium

出　　处：《Plasma Science and Technology》2020年第5期5-15,共11页等离子体科学和技术（英文版）

基　　金：sponsored by Flanders Innovation and Entrepreneurship(IWT.141064);a travel grant(V4.128.18N)from Research Foundation—Flanders(FWO);supported by the Research Foundation Flanders(FWO)under project grant G078316N;funded by the Research Foundation—Flanders(FWO);the Flemish Government—department EWI。

摘　　要：The iterative Monte Carlo(MC)code EMC3-EIRENE is frequently used for plasma edge simulations in 3 D applications.So far,a quantitative evaluation of the numerical quality of the code results remains an open issue.In this paper,we demonstrate a framework for the practical assessment of accuracy and convergence with EMC3-EIRENE.Moreover,we provide a first accuracy analysis with EMC3-EIRENE for a DIII-D divertor edge plasma case.First,we introduce post-processing averaging to efficiently reduce the variance of the statistical error.Then,we estimate the deterministic error contributions based on their theoretical reduction rates by comparing solutions with a different grid resolution,time step,or number of MC particles per iteration.Finally,using parameterized expressions for the error and the computational time,suitable numerical parameters are determined to achieve faster and/or more accurate results.We found that simulations can be more than twice as fast without losing accuracy by making use of post-processing averaging and choosing optimal parameters.In addition,we conclude that the discretization error is the dominant error contribution for the case selected in this paper,which demonstrates the importance of constructing an adequate mesh.

关 键 词：CONVERGENCE Monte Carlo NUMERICS plasma edge EMC3-EIRENE 

分 类 号：TL631.2[核科学技术—核技术及应用]