化学沉积法制备功能性化学镀锡层的研究  

Study on Preparation of Functional Electroless Tin Plating by Chemical Deposition

作　　者：周亚[1] Zhou Ya

机构地区：[1]晋中职业技术学院生物工程学院,山西晋中030600

出　　处：《化工设计通讯》2020年第6期172-173,共2页Chemical Engineering Design Communications

摘　　要：近年来化学溶剂沉积法制备在外延薄膜大面积应用上得到重视,对于制备高温超导涂层导体来说,这种方法具有化学组分、区域性化学计量与控制成本低量等特性。对化学沉积法制备功能性化学镀锡层进行研究,期望对促进化学镀锡层的原理分析和制备功能化演进具有参考价值。In recent years,the preparation of chemical solvent deposition method has been paid attention to in the large-area application of epitaxial thin films.For the preparation of high-temperature superconducting coated conductors,this method has the characteristics of chemical composition,regional stoichiometry and low cost control.In this paper,the research on the preparation of functional electroless tin plating by chemical deposition is expected to be of reference value to promote the principle analysis of electroless tin plating and the evolution of the preparation of functionalization.

关 键 词：化学沉积法 制备功能 化学镀锡层 

分 类 号：TG174.4[金属学及工艺—金属表面处理]