退火温度对银-二氧化硅核壳(Ag@SiO2/TiO2)薄膜结构,光学特性以及光催化性能的影响  

Effect of annealing temperature on the structural,optical properties and photocatalytic properties of Ag@SiO2/TiO2 thin films

作　　者：郝殿中[1] 韩培高[1] 牛明生[1] HAO Dian-zhong;HAN Pei-gao;NIU Ming-sheng(Institute of Laser Research,Shandong Provincial Key Laboratory of Laser Polarization and Information Technology,Qufu Normal University,Qufu Shandong,273165 China)

机构地区：[1]曲阜师范大学激光研究所,山东省激光偏光与信息技术重点实验室,山东曲阜273165

出　　处：《光电子．激光》2020年第3期288-292,共5页Journal of Optoelectronics·Laser

基　　金：山东省重点研发计划(2017GSF17125)资助项目。

摘　　要：局部表面等离子共振广泛应用于光催化和太阳能电池等领域。采用电子束和热沉积技术,在融石英和Si片上制备了Ag@SiO2/TiO2薄膜。在300℃,400℃,500℃,600℃温度下,薄膜在空气氛围下退火2 h。采用拉曼光谱仪,紫外-可见分光光度计(UV-Vis)等手段对微结构,光学性能等特性进行了表征。利用能谱仪测定了元素成分及含量。考察了薄膜在水溶液中降解甲基橙的光催化活性。结果表明:Ag@SiO2/TiO2薄膜具有优异的光催化性能。测试结果表明:在250℃下制备的TiO2薄膜为无定形结构;在本实验条件下,随着退火温度的升高,薄膜呈锐钛矿结构;锐钛矿相表现出了更好的光催化性能。Localized Surface Plasmon Resonance(LSPR) was widely used in photocatalysis and solar cells fields.The Ag@SiO2/TiO2 thin films were deposited on fused quartz and Si substrates employing electron beam and thermal evaporation technique followed thermal annealing in air atmosphere at 300 ℃,400 ℃,500 ℃,600 ℃ for two hours.The prepared samples were characterized with the Raman spectrometer,UV-Vis spectrophotometer for microstructure,optical,respectively.The composition and content of elements were determined by energy dispersive spectrometer.The photocatalytic activity of synthesized thin films were evaluated for degradation of methyl orange in aqueous solution.Results indicated the as-deposited films(250 ℃) have amorphous nature;with the increase of the annealing temperature,the film is in the anatase structure base on the condition of this experiment.while films annealed at 400 ℃-600 ℃ show polycrystalline in nature.Anatase phase presents better photocatalytic performance.

关 键 词：薄膜光学 Ag@SiO2/TiO2纳米粒子 退火温度 改性光催化反应 微结构 光学性能 

分 类 号：O643[理学—物理化学]