镍铬合金基带抛光电流对Y-Ba-Cu-O高温超导带材性能的影响  

Effect of polishing current for nickel–chromium alloy substrate on properties of Y–Ba–Cu–O high-temperature superconductor strip

作　　者：夏金成 李小宝 熊旭明 张爱兵 蔡渊 XIA Jincheng;LI Xiaobao;XIONG Xuming;ZHANG Aibing;CAI Yuan(Suzhou Advanced Materials Research Institute Co.,Ltd.,Suzhou 215123,China)

机构地区：[1]苏州新材料研究所有限公司,江苏苏州215123

出　　处：《电镀与涂饰》2020年第11期714-717,共4页Electroplating & Finishing

摘　　要：对C276镍铬合金基带进行电化学抛光后,采用磁控溅射技术制备中间层或过渡层,然后通过金属有机物化学气相沉积法制备Y-Ba-Cu-O高温超导层。考察了抛光电流对抛光带表面粗糙度、中间层或过渡层面内织构度数和超导层的临界电流的影响。确定了合适的基带抛光电流范围为60~100 A,最佳为90 A。A high-temperature Y–Ba–Cu–O superconductor strip was prepared by metal–organic chemical vapor deposition on C276 nickel–chromium alloy substrate electrochemically polished and magnetron sputtered with intermediate or transition layer.The effect of polishing current on surface roughness of the polished substrate,in-plane texture of the middle layer or transition layer,and critical current of the superconducting layer were studied.The appropriate polishing current was determined in a range from 60 A to 100 A,and 90 A was recommended.

关 键 词：第二代高温超导体 钇钡铜氧 电化学抛光 表面粗糙度 织构 临界电流 

分 类 号：TM262[一般工业技术—材料科学与工程] TG175[电气工程—电工理论与新技术]