基于VCSEL的湿法氧化工艺的温度依赖性研究  

Temperature Dependence of Wet Oxidation Process Based on VCSEL

作　　者：陈磊 罗妍 冯源 晏长岭 范杰 高欣 邹永刚 郝永芹 Chen Lei;Luo Yan;Feng Yuan;Yan Changling;Fan Jie;Gao Xin;Zou Yonggang;Hao Yongqin(State Key Laboratory of High Power Semiconductor Laser,Changchun University of Science and Technology,Changchun,Jilin 130022,China)

机构地区：[1]长春理工大学高功率半导体激光国家重点实验室,吉林长春130022

出　　处：《中国激光》2020年第7期275-280,共6页Chinese Journal of Lasers

基　　金：国家自然科学基金(11474038);吉林省科技发展计划(20200401073GX)。

摘　　要：湿法氧化工艺是垂直腔面发射激光器(VCSEL)制备过程中极为关键的技术,但目前氧化工艺的稳定性和可控性仍有待完善。针对氧化过程中的核心因素——氧化温度进行深入研究,通过设置对照实验,探究了氧化温度对氧化速率及氧化孔形状的作用规律,这对精确控制氧化孔的尺寸和形貌并改善器件的电光特性具有重要意义。同时根据AlGaAs氧化反应机理,优化设计了氧化温控曲线,实验结果表明,通过该氧化温控氧化的样品具有非常良好的热稳定性,整体结构可靠性高。The wet oxidation process is a key technology for fabricating a vertical cavity surface emitting laser(VCSEL),but the stability and controllability of the oxidation process require further improvement.Herein,the oxidation temperature,which is the core factor in the oxidation process,was studied in depth.By establishing a control experiment,the effect of the oxidation temperature on oxidation rate and shape of the oxidation pore was explored.Understanding this effect is vital to accurately control the size and shape of the oxidation pore and improve the electro-optical characteristics of the device.Moreover,the oxidation temperature control curve was simultaneously optimized based on the oxidation reaction mechanism of AlGaAs.Experimental results indicate that samples oxidized based on the oxidation temperature control curve exhibit excellent thermal stability and high overall structural reliability.

关 键 词：激光器 半导体激光器 垂直腔面发射激光器 湿法氧化 氧化温度 氧化孔 

分 类 号：TN248.4[电子电信—物理电子学]