防离子反馈微通道板表面碳污染去除的试验研究  

Experimental Study of Carbon Pollution Removal from Microchannel Plate with Ion Barrier Film

作　　者：杨晓军 李丹 乔凯[1,2] 师宏立 郝子恒 张妮 刘峰 刘旭川 YANG Xiaojun;LI Dan;QIAO Kai;SHI Hongli;HAO Ziheng;ZHANG Ni;LIU Feng;LIU Xuchuan(Science and Technology on Low-Light-Level Night Vision Laboratory,Xi′an 710065,China;Kunming Institute of Physics,Kunming 650223,China)

机构地区：[1]微光夜视技术重点实验室,陕西西安710065 [2]昆明物理研究所,云南昆明650223

出　　处：《红外技术》2020年第8期747-751,共5页Infrared Technology

摘　　要：针对带防离子反馈膜的微通道板(MCP)普遍存在的C污染现象,开展了真空热处理、紫外臭氧辐照及氢气热处理试验,对各个试验结果进行了MCP电性能测试及俄歇电子能谱(AES)研究,着重分析了MCP表面C含量及MCP性能随不同试验方法的变化趋势。试验结果表明,C含量的降低对MCP性能的提升具有显著作用,真空热处理对C的分解作用甚微,紫外臭氧辐照及氢气热处理均可以较为彻底地去除MCP表面C污染,并且氢气热处理对MCP增益性能的提升作用显著,效率最高。To investigate the common C pollution phenomenon of the microchannel plate(MCP)with an ion barrier film,we conducted vacuum heating,ultraviolet irradiation,and hydrogen heating tests.Auger electron spectroscopy and MCP electrical performance test are performed on each test result.Furthermore,the trends of MCP C content and MCP performance are analyzed using different methods.The analysis results show that the reduction in C content significantly improved MCP performance.The vacuum heating process does not significantly affect the decomposition of C;however,the UV irradiation and hydrogen heating processes can completely remove MCP C pollution.Finally,hydrogen heating significantly improved the MCP gain performance and resulted in the highest efficiency.

关 键 词：C污染 防离子反馈MCP 紫外辐照 氢气处理 

分 类 号：TN223[电子电信—物理电子学]