强烘前后压印聚酰亚胺薄膜分子聚集状态研究  

Study on molecular aggregation state of imprinted polyimide film before and after strong drying

作　　者：黄卫庄 Huang Weizhuang(School of Electrical Information&Engineering,Jiangsu University of Technology,Changzhou 213001,Jiangsu,China)

机构地区：[1]江苏理工学院电气信息工程学院,江苏常州213001

出　　处：《橡塑技术与装备》2020年第18期19-25,共7页China Rubber/Plastics Technology and Equipment

摘　　要：聚酰亚胺(PI),聚(酰胺酸)薄膜的前期要使用纳米压印技术(NIL),然后经过强烈烘焙得到压印的聚酰亚胺薄膜。通过掠入射广角X射线衍射的方法研究了强烘前后压印的聚酰亚胺薄膜的分子聚集状态,并与平整的聚酰亚胺薄膜进行了对比。发现纳米压印技术和强烘能强有力地影响聚酰亚胺薄膜的分子聚集状态。强烘前,聚酰亚胺链在线条上与直线方向平行排列。强烘后,在有序范围的排列变成聚酰亚胺分子链轴线与直线方向的垂直度显著增加了而平行度降低了。通过与平整的聚酰亚胺薄膜的比较,发现压印的聚酰亚胺薄膜的结晶度明显地提高了。Nanoimprint lithography(NIL)should be used in the early stage of polyimide(PI)and poly(amide acid)films.Then the polyimide film was obtained by strong drying.The molecular aggregation state of polyimide film imprinted before and after strong drying was studied by grazing incidence wide angle X-ray diffraction,and compared with that of flat polyimide film.It was found that nano imprinting and strong drying could strongly affect the molecular aggregation state of polyimide films.The polyimide chains were arranged parallel to the linear direction on the line before strong drying.After strong drying,the perpendicularity of the polyimide molecular chain axis and the straight line direction increased significantly,but the parallelism decreased.Compared with the flat polyimide film,the crystallinity of the imprinted polyimide film is obviously improved.

关 键 词：掠入射广角X射线衍射 分子聚集状态 压印的聚酰亚胺薄膜 强烘 

分 类 号：TQ323.7[化学工程—合成树脂塑料工业]