氮化硅滚子化学机械复合抛光工艺参数与表面粗糙度的关系  

Relationship between Chemical Mechanical Compound Polishing Process Parameters and Roughness of Silicon Nitride Rollers

作　　者：谭晓媛 TAN Xiaoyuan(College of Chemistry and Chemical Engineering,Gannan Normal University,Ganzhou,341000,Jiangxi,China)

机构地区：[1]赣南师范大学化学化工学院,江西赣州341000

出　　处：《中国陶瓷工业》2020年第5期16-19,共4页China Ceramic Industry

摘　　要：为优化氮化硅陶瓷滚子化学机械复合抛光技术工艺参数,得到高性能氮化硅陶瓷滚子。通过改变抛光机主轴转速及磁流变抛光液温度,探究各参数对氮化硅陶瓷滚子表面粗糙的影响,并获得各参数对表面粗糙度的影响曲线。总结对应影响规律,结果表明:随着主轴转速的增大,氮化硅陶瓷滚子表面粗糙度逐渐减小,且变化率逐渐减小;当其他条件不变时,磁流变抛光液温度对氮化硅陶瓷滚子表面粗糙度影响不大,保持在0.035μm左右。To optimize the parameters of the Silicon Nitride ceramic roller’s chemical mechanical polishing compound technology and get Silicon Nitride ceramic roller wih high performance,the spindle speed of the polishing machine and magnetorheological polishing fluid temperature are adjusted so as to explore various parameters on the effect of Silicon Nitride ceramic roller surface roughness.The influence of various parameters on surface roughness curves are obtained and the corresponding influence law are summarized.The results show that with the increase of spindle speed,Silicon Nitride ceramic roller surface roughness decreases,and the rate of change gradually decreased.When other conditions remain unchanged,the temperature of magnetorheological polishing fluid has little effect on the surface roughness of Silicon Nitride ceramic roller,which remains at about 0.035μm.

关 键 词：氮化硅陶瓷滚子 化学机械 复合抛光 粗糙度 

分 类 号：TQ174.75[化学工程—陶瓷工业]