基于DMD无掩膜光刻快速制作亲疏水图案化表面  

Quickly Making Hydrophilic-hydrophobic Patterned Surface Based on DMD Maskless Lithography

作　　者：陈鹏 李木军[1] CHEN Peng;LI Mujun(Department of Precision Machinery and Precision Instruments,University of Science and Technology of China,Hefei 230026,China)

机构地区：[1]中国科学技术大学精密机械与精密仪器系,安徽合肥230026

出　　处：《新技术新工艺》2020年第9期21-27,共7页New Technology & New Process

基　　金：国家自然科学基金资助项目(51475442)。

摘　　要：亲疏水图案化表面在表面张力限制的微流控技术中能够发挥显著作用。常见的方法在制作表面的微图案时都需要实物掩模版,这类方法不具备灵活调节制造亲疏水表面微图案的形状与尺寸的能力,并且因制作掩膜而导致制作成本和时间成本都很高。因此,提出了基于DMD无掩膜光刻技术快速制作亲疏水图案化表面的方法并可用于自组装微液滴阵列。该方法利用DMD无掩膜曝光系统进行加工,一步成型地完成了亲疏水图案化表面的疏水处理和微图案化处理。这种方法无需实物掩模,能够灵活调控加工表面疏水图案的形状与尺寸,工艺简单快捷,降低了制作成本。Hydrophilic-hydrophobic patterned surfaces played a significant role in surface tension confined microfluidics control technology.Common methods required physical masks when making micro-patterns on the surface,this type of method did not have the ability to flexibly adjust the shape and size of micro-patterns for making hydrophilic-hydrophobic patterned surfaces,and because of making physical masks,the production and time costs were very high,so a method for rapidly preparing hydrophilic-hydrophobic patterned surfaces was proposed based on the photosensitive resin and it could be used for self-assembled microdroplet arrays.The method was used to proces the DMD maskless lithography,which made the hydrophobic treatment and micro-patterning treatment of the hydrophilic-hydrophobic patterned surface completed in one step.The method did not need a physical mask,and could flexibly adjust the shape and size of the processing surface hydrophobic pattern,the process was simple and fast,and the manufacturing cost was reduced.

关 键 词：DMD芯片 无掩膜光刻技术 数字掩膜 光敏树脂 亲疏水图案化表面 微液滴阵列 

分 类 号：TH703[机械工程—仪器科学与技术]