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作 者:Haidong LU Maogen SU Qi MIN Shiquan CAO Siqi HE Chenzhong DONG Yanbiao FU 卢海东;苏茂根;敏琦;曹世权;何思奇;董晨钟;符彦飙
机构地区:[1]Key Laboratory of Atomic and Molecular Physics&Functional Material of Gansu Province,College of Physics and Electronic Engineering,Northwest Normal University,Lanzhou 730070,People's Republic of China [2]Joint Laboratory of Atomic and Molecular Physics,Northwest Normal University and Institute of Modern Physics of Chinese Academy of Sciences,Lanzhou 730070,People's Republic of China
出 处:《Plasma Science and Technology》2020年第10期39-44,共6页等离子体科学和技术(英文版)
基 金:supported by the National Key Research and Development Program of China (Grant No. 2017YFA0402300);National Natural Science Foundation of China (NSFC) (Grant Nos. 11904293, 11874051)。
摘 要:Armed with four different steady-state collisional-radiative(CR) models,we investigated the effect of dielectronic recombination(DR) on the charge-state distribution in laser-produced silicon plasma. To assess this effect,we performed a series of temporally resolved spectra of highly charged Si ions in the extreme ultraviolet region.Ab initio calculations of the DR rate coefficients were done for Si^(6+)–Si^(4+) ions. We also analyzed the evolution of the collisional ionization, radiative recombination, three-body recombination, photo-ionization, and DR rate coefficients as a function of electron temperature. The electron temperature and electron density for different delay times were obtained by comparing the normalized experimental and simulated spectra. The ion fraction and average charge state from the four different CR models were also obtained. The results indicate that the DR process has a greater influence in the stage of plasma evolution that cannot be neglected in plasma diagnoses.
关 键 词:dielectronic recombination laser-produced plasmas collisional-radiative model charge-state distribution
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