集成电路铜布线CMP后BTA残留红外检测分析的研究  

Research on Infrared Detection and Analysis of BTA Residue after CMP of IC Copper Wiring

作　　者：刘宜霖 檀柏梅 高宝红 岳爽 刘雅文 LIU Yilin;TAN Baimei;GAO Baohong;YUE Shuang;LIU YAWEN(The 45th Research Institute of CETC,Beijing 100176,China;School of Electronics and Information Engineering,Hebei University of Technology,Tianjin 300130,China;Tianjin Key Laboratory of Electronic Materials and Devices,Tianjin 300130,China;Langfang Normal University,Langfang 065000,China)

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176 [2]河北工业大学电子信息工程学院,天津300130 [3]天津市电子材料与器件重点实验室,天津300130 [4]廊坊师范学院,河北廊坊065000

出　　处：《电子工业专用设备》2020年第5期1-5,28,共6页Equipment for Electronic Products Manufacturing

基　　金：国家中长期科技发展规划02科技重大专项资助项目(2016ZX02301003-004-007);河北省自然科学基金项目(F2018202174);河北省博士后择优资助项目(B2015003010)。

摘　　要：BTA是集成电路多层铜布线CMP中常用的抗蚀剂,CMP后在表面的残留会严重影响其他工序的正常进行并损害集成电路性能,因此针对BTA的清洗及检测显得尤为重要。红外光谱检测法是针对有机物检测的有效手段之一。采用傅里叶红外光谱仪系统,对Cu CMP后的BTA残留进行红外检测分析研究,实验得出了BTA以及Cu(II)-BTA的特征红外光谱,对其进行分析并建立了Cu(II)-BTA特征峰值库。采用FA/O II型螯合剂对BTA沾污的Cu光片进行清洗,利用Cu(II)-BTA特征峰信息对清洗前后的Cu片表面进行红外光谱分析,结果表明此种红外光谱分析法检测BTA残留准确可靠,FA/O II型螯合剂对BTA去除有效。BTA is an anticorrosive additive commonly used in Copper Interconnection CMP.After CMP,BTA is one of the residues on the wafer surface seriously affecting the following wafer manufacturing processes,and damaging the performance of Integrated Circuits(IC),which must be removed in the cleaning process.Infrared detection is one of the effective means of organic matter detection.In this report,Fourier infrared spectrometer system is used to detect and analyze BTA residues after Cu-CMP,the characteristic infrared spectrums of BTA and Cu(II)-BTA are obtained by experiments,the eigenvalues library of Cu-BTA infrared spectrums is established.Subsequently,FA/O II chelating agent is used to clean the blanket copper wafer contaminated with BTA,the surface of blanket copper wafer before and after cleaning was analyzed by infrared spectrum using eigenvalues of Cu(II)-BTA infrared spectrum,the results show that the infrared spectrum analysis method is accurate and reliable for detecting BTA residue,FA/O II chelating agent is effective for the removal of BTA.

关 键 词：Cu-BTA(苯骈三氮唑) 傅里叶红外光谱检测技术 FTIR-ITR红外光谱 CMP后清洗 

分 类 号：TN307[电子电信—物理电子学]