基于低能离子轰击的亚波长纳米结构制备  

Preparation of Subwavelength Nanostructures Based on Low-Energy Ion Bombardment

作　　者：杨高元 蔡茂琦 李金昱 陈火耀[1] 刘颖[1] 洪义麟[1] Yang Gaoyuan;Cai Maoqi;Li Jinyu;Chen Huoyao;Liu Ying;Hong Yilin(National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei,Anhui 230029,China)

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230029

出　　处：《光学学报》2020年第17期208-211,共4页Acta Optica Sinica

基　　金：国家自然科学基金(11675169);中德科学基金研究交流中心资助中德合作研究项目(GZ983)。

摘　　要：利用低能离子轰击在光刻胶表面诱导产生自组织纳米波纹结构,将其作为掩模,与反应离子束刻蚀技术相结合,在熔石英表面制备了亚波长纳米结构。与直接利用离子轰击产生的纳米结构相比,此方法制备的结构显著提高了自组织纳米结构的振幅和高宽比。这种具有表面亚波长纳米结构的熔石英样品在600~1300 nm波段范围内的透过率约为94%。初步结果显示离子轰击技术在功能性表面纳米结构制备方面极具潜力。In this study,self-organized nanoripples on photoresist surfaces are produced through low-energy ion bombardment(IB).Subsequently,the IB-induced photoresist nanoripples are considered as masks for fabricating subwavelength nanostructures on fused silica surfaces by reactive ion beam etching technique.Compared with pure-IB-induced fused silica nanoripples,the amplitude and aspect ratio of the proposed nanostructures increases significantly.The transmittance of the subwavelength nanostructured fused silica surfaces increases to approximately 94%for wavelengths from 600 nm to 1300 nm.Preliminary results reveal the potential of ion bombardment in the preparation of functional surface nanostructures.

关 键 词：激光加工 低能离子轰击 光刻胶 自组织纳米结构 熔石英 亚波长结构 

分 类 号：O539[理学—等离子体物理]