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作 者:庄健[1] 王志武 廖晓波 ZHUANG Jian;WANG Zhi-wu;LIAO Xiao-bo(School of Mechanical Engineering, Xi′an Jiaotong University, Xi′an 710049, China;School of Manufacturing Science and Engineering, Southwest University of Science and Technology, Mianyang 621010, China)
机构地区:[1]西安交通大学机械工程学院,陕西西安710049 [2]西南科技大学制造科学与工程学院,四川绵阳621010
出 处:《光学精密工程》2020年第10期2203-2214,共12页Optics and Precision Engineering
基 金:国家自然科学基金面上项目(No.51375363);陕西省科技厅工业公关项目(No.2013GY2-04);中央高校基本科研业务费专项资金资助项目(No.Z201707084)。
摘 要:为了解决离子电导显微成像系统中传统跳跃工作模式高速扫描时存在的运动过冲以及成像速度慢的问题,提出了一种基于双压电纳米定位平台的高速扫描方法。根据扫描系统需求提出了采用大行程-慢速和小行程-快速压电纳米定位平台串联的设计方案,满足探针Z向测量量程要求并可快速回提探针。以菱形位移放大机构和导向机构为构型,设计并确定双压电驱动扫描平台的关键几何参数。基于解析模型计算了定位平台的静力学性能参数并采用有限元分析方法分析了双压电平台的静/动态特性。最后,加工了双压电平台样机并进行了离子电流过冲和形貌扫描成像的测试。实验结果表明所设计的双压电驱动探针定位平台在保证成像稳定的前提下可使下探速度至少达到500 nm/ms,有效地减小了电流过冲,提高了系统成像效率。To address motion overshoot and low imaging speed of the hopping mode inconventional scanning ion-conductance microscopy(SICM),this paper proposes a high-speed scanning method based on a dual-stage nanopositioning system.A design scheme consisting of a long-range actuator operating along with a high-speed actuator is proposed,according to the need for the SICM measurement range in the Z direction.The pipet probe can approach the sample surface with a highspeed,without contact.Rhombus-type amplification and guiding mechanism are used as the basic configuration.The key parameters of the dual-stage nanopositioner are determined by an analytical modeling.The static and dynamic characteristics of the dual-stage nanopositioner are evaluated via finite-element analysis.The final prototype is processed and overshoot and imaging experiments are performed.Experimental results show that the designed Z direction nanopositioning stage driven by the dual actuator can significantly improve the probe approach speed to at least 500 nm/ms,which effectively improves the imaging efficiency of the hopping mode,without reducing the imaging stability.
关 键 词:离子电导扫描成像系统 双压电扫描器 位移放大机构 跳跃工作模式
分 类 号:TN384[电子电信—物理电子学]
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