Investigation of electropolishing characteristics of tungsten in ecofriendly sodium hydroxide aqueous solution  

作　　者：Wei Han Feng-Zhou Fang 

机构地区：[1]Centre of Micro/Nano manufacturing Technology(MNMTDublin),University College Dublin,Dublin 4,Ireland [2]State Key Laboratory of Precision Measuring Technology and Instruments,Centre of Micro/Nano Manufacturing Technology(MNMT),Tianjin University,Tianjin 300072,People’s Republic of China

出　　处：《Advances in Manufacturing》2020年第3期265-278,共14页先进制造进展（英文版）

基　　金：the support received from the Science Foundation Ireland(SFI)(Grant No.15/RP/B3208);the National Natural Science Foundation of China(NSFC)(Grant No.61635008);This project has also received funding from the Enterprise Ireland and the European Union's Horizon 2020 Research and Innovation Programme under the Marie Sklodowska-Curie Grant agreement(Grant No.713654).

摘　　要：In this study,an eco-friendly electrolyte for electropolishing tungsten and the minimum material removal depth on the electropolished tungsten surface are investigated using an electrochemical etching method.Using a concentrated acid electrolyte,the polarization curve and current density transient are observed.For a NaOH electrolyte,the effects of interelectrode gap and electrolyte concentration on electropolishing are investigated.The differences in electropolishing characteristics are compared among different electrolyte types.Microholes are etched on the electropolished tungsten surface to determine the minimum material removal depth on the tungsten surface.Experimental results indicate the color effect due to a change in the thickness of the oxide film on the tungsten surface after electropolishing with a concentrated acid electrolyte.The surface roughness decreases with the interelectrode gap width owing to the increased current density when using the NaOH electrolyte.However,the electropolishing effect is less prominent with a significantly smaller gap because the generated bubbles are unable to escape from the narrow working gap in time.A material removal depth of less than 10 nm is achieved on the tungsten surface in an area of diameter 300 lm,using the electrochemical etching method.

关 键 词：ELECTROPOLISHING NaOH solution Surface roughness TUNGSTEN ETCHING 

分 类 号：TG146.411[一般工业技术—材料科学与工程]