Microstructure and Oxidation Resistance of V Thin Films Deposited by Magnetron Sputtering at Room Temperature  

作　　者：ZHANG Song ZHANG Ziyu LI Jun TU Rong SHEN Qiang WANG Chuanbin LUO Guoqiang ZHANG Lianmeng 章嵩;ZHANG Ziyu;李俊;TU Rong;SHEN Qiang;WANG Chuanbin;LUO Guoqiang;ZHANG Lianmeng(State Key Laboratory,of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology,Wuhan 430070,China;National Key Laboratory for Shock Wave and Detonation Physics,Institute of Fluid Physics,Mianyang 621900,China)

机构地区：[1]State Key Laboratory,of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology,Wuhan 430070,China [2]National Key Laboratory for Shock Wave and Detonation Physics,Institute of Fluid Physics,Mianyang 621900,China

出　　处：《Journal of Wuhan University of Technology(Materials Science)》2020年第5期879-884,共6页武汉理工大学学报（材料科学英文版）

基　　金：Funded by the Science Challenge Project(No.TZ2016001);the National Natural Science Foundation of China(Nos.11602251,51861145306 and 51872212);the 111 Project(No.B13035);Joint Fund of Ministry of Education for Pre-research of Equipment(No.6141A02022257);supported by the International Science&Technology Cooperation Program of China(Nos.2018YFE0103600,2014DFA53090);the Technological Innovation of Hubei Province,China(No.2019AAA030)。

摘　　要：Vanadium films were deposited on Si(100)substrates at room temperature by direct current(DC)magnetron sputtering.The microstructure and surface morphology were studied using scanning electron microscopy(SEM)and atomic force microscope(AFM).The oxidation resistance of films in air was studied using X-ray photoelectron spectroscopy(XPS)and transmission electron microscopy(TEM).The results showed that the amorphous vanadium film with a flatter surface had higher oxidation resistance than the crystalline film when exposed to atmosphere.The rapid formation of the thin oxide layer of amorphous vanadium film could protect the film from sustained oxidation,and the relative reasons were discussed.

关 键 词：vanadium films magnetron sputtering sputtering power(Ps) MICROSTRUCTURE oxidation resistance 

分 类 号：TB383.2[一般工业技术—材料科学与工程]