低压等离子喷涂TaSi2/MoSi2涂层组织结构及性能研究  

Microstructure and Properties of TaSi2/MoSi2 Coating Fabricated by Low Pressure Plasma Spray

作　　者：倪立勇[1] 杨震晓[1] 马康智 文波[1] 曲栋 杨杰[1] Liyong Ni;Zhenxiao Yang;Kangzhi Ma;Bo Wen;Dong Qu;Jie Yang(Aerospace Research Institute of Materials and Processing Technology,Beijing 100076)

机构地区：[1]航天材料及工艺研究所,北京100076

出　　处：《热喷涂技术》2020年第3期70-75,共6页Thermal Spray Technology

摘　　要：采用低压等离子喷涂技术制备了TaSi2/MoSi2涂层。通过XRD、SEM、EDS等手段分析了涂层氧化前后组织结构及相结构。结果表明,TaSi2/MoSi2涂层呈现典型的层状结构,组织结构均匀致密,孔隙率为3.1%;涂层由TaSi2和MoSi2两相组成,喷涂过程中未发生相结构转变;空气中1650℃氧化30min后,涂层表面生成致密和玻璃态SiO2保护膜,涂层具有良好的自愈合能力,表现出良好的高温抗氧化性能。TaSi2/MoSi2 coating was fabricated by Low Pressure Plasma Spray (LPPS). The chemical compositionand microstructure of the coating was characterized by SEM, XRD and EDS. The results showed that the TaSi2/MoSi2 coating was dense with low porosity (3.1%) and dense lamellar microstructure. The coating was composedof hexagonal TaSi2 and MoSi2 phase. A dense and vitreous SiO2 protective film was formed on the coating surfaceafter oxidation at 1650℃ for 30min. The coating exhibits good self-healing ability and high temperature oxidationresistance.

关 键 词：TaSi2/MoSi2涂层 低压等离子喷涂 高温抗氧化涂层 

分 类 号：TG174.4[金属学及工艺—金属表面处理]