介电泳效应磨粒流抛光中的电极形态  

Electrode Morphology in Dielectrophoresis Abrasive Flow Polishing

作　　者：邓乾发 郑涛 袁巨龙 王旭 张学良 吕冰海[1] DENG Qianfa;ZHENG Tao;YUAN Julong;WANG Xu;ZHANG Xueliang;LYU Binghai(Ultra-precsion Machining Center, Zhejiang University of Technology, Hangzhou, 310023;Hangzhou Polytechnic, Hangzhou, 311402)

机构地区：[1]浙江工业大学超精密加工研究中心,杭州310023 [2]杭州科技职业技术学院,杭州311402

出　　处：《中国机械工程》2020年第23期2822-2828,共7页China Mechanical Engineering

基　　金：国家自然科学基金资助项目(51775511,U1809221,51805485,U1604254);浙江省自然科学基金资助项目(LY17E050022,LGG19E050006);中国博士后科学基金资助项目(2019M652138)。

摘　　要：针对薄壁陶瓷工件内表面抛光,提出一种基于介电泳效应的磨粒流抛光方法。将非均匀电场布置于陶瓷工件外表面,极化磨粒,实现陶瓷工件内表面高效抛光。仿真分析发现:电极间隙比为2时,SiC磨粒具有最好的介电泳效应,参与抛光的磨粒最多。陶瓷工件初始内表面粗糙度值Ra为(208±5)nm时,抛光10 h后,无介电泳效应的磨粒流抛光工件内表面粗糙度值Ra为51 nm,有介电泳效应的磨粒流抛光工件内表面粗糙度值Ra为23 nm。A method of dielectrophoresis abrasive flow polishing was proposed for internal surface polishing of thin-walled ceramic workpieces.A non-uniform electric field was arranged on outer surfaces of the ceramic workpieces to be polished,and the abrasive particles were polarized to implement efficient polishing of the ceramic workpiece inner surfaces.Simulation results show that when electrode gap ratio is as 2,SiC abrasive particles have the best dielectrophoresis effectiveness and the most abrasive particles involved in polishing.When initial internal surface roughness value of workpiece Ra is as(208±5)nm,after 10 h polishing,the internal surface roughness value Ra of the workpiecess is as 51nm without dielectrophoresis effectiveness,and that of the workpieces is as 23 nm with dielectrophoresis effectiveness.

关 键 词：磨粒 介电泳效应 抛光 陶瓷 内表面 

分 类 号：TH161[机械工程—机械制造及自动化]