Al2O3@5A沸石材料制备及其空间分子污染吸附性能  

Preparation and Adsorption Properties of Al2O3@5A Zeolite Composites for Space Molecular Contamination

作　　者：宫向华 祖丽颉 吴金珠 李杨 吴晓宏 GONG Xiang-hua;ZU Li-jie;WU Jin-zhu;LI Yang;WU Xiao-hong(School of Chemistry and Chemical Engineering,Harbin Institute of Technology,Harbin 150000,China)

机构地区：[1]哈尔滨工业大学化工与化学学院,哈尔滨150000

出　　处：《表面技术》2020年第12期14-22,共9页Surface Technology

基　　金：国家自然科学基金(51702067)。

摘　　要：目的采用原子层沉积技术(ALD)制备了Al2O3@5A沸石分子筛复合材料,以提高材料的综合应用性能。方法采用三甲基铝为铝源,水为氧源,氮气为载气,工艺压力为26.6Pa,沉积温度为150℃,循环周期为300,在5A沸石分子筛球体表面生长膜厚约为30 nm的Al2O3非晶薄膜,探究Al2O3薄膜对5A沸石分子筛的机械强度和吸附性能的影响。结果Al2O3薄膜均匀牢度地包覆在5A沸石分子筛表面,有效抑制了分子筛的破裂掉粉。非晶态Al2O3薄膜呈现均匀粗糙的纳米岛状形貌,具有优异的疏水性。此外,Al2O3薄膜提供更多的活性铝,有利于与有机污染物分子发生化学吸附。结论采用ALD技术制备了形貌均匀、结构致密的Al2O3非晶薄膜,实现了对基底材料5A沸石分子筛的表面改性,不但改善了材料的机械强度和使用稳定性,而且提高了材料对有机污染物的吸附能力。Al2O3@5 A zeolite composite was prepared by atomic layer deposition(ALD)to improve its comprehensive application performance.Trimethyl aluminum was used as an aluminum source,water as an oxygen source and nitrogen as carrier gas.Process pressure was 26.6 Pa,deposition temperature was 150℃,and cycles were 300.The Al2O3 amorphous thin film with the thickness of about 30 nm was grown on the surfaces of 5 A zeolite.The influence of Al2O3 thin film on the mechanical strength and adsorption performance of 5 A zeolite was investigated.The Al2O3 thin film is uniformly coated on the surfaces of 5 A zeolite,which effectively inhibits the fracture and slag-dropping.The amorphous Al2O3 thin film shows uniform nano-island morphology,leading to excellent hydrophobicity.In addition,the Al2O3 thin film provides more active aluminum,which is conducive to chemisorption with organic pollutant molecules.The surface modification of 5 A zeolite was realized by using ALD technique,the obtained unique Al2O3 amorphous film not only improves its mechanical strength and stability,but also enhances the adsorption capacity for organic pollutants.

关 键 词：沸石 三氧化二铝 原子层沉积技术 空间分子污染 吸附 

分 类 号：TB33[一般工业技术—材料科学与工程]