铝镍钴永磁体离子镀铜活化处理对镀层性能的影响  

Effect of Activation Treatment on the Properties of Ion Copper Plating Layer on Aluminum-Nickel-Cobalt Permanent Magnet

作　　者：周晓燕 李冬英 邹利华[2,3] 赵乘麟 李梦奇[2,3] ZHOU Xiao-yan;LI Dong-ying;ZOU Li-hua;ZHAO Cheng-lin;LI Meng-qi(School of Information Engineering,Shaoyang University,Shaoyang 422000,China;School of Mechanical and Energy Engineering,Shaoyang University,Shaoyang 422000,China;Key Laboratory of Hunan Province for Efficient Power System and Intelligent Manufacturing,Shaoyang University,Shaoyang 422000,China)

机构地区：[1]邵阳学院信息工程学院,湖南邵阳422000 [2]邵阳学院机械与能源工程学院,湖南邵阳422000 [3]邵阳学院高效动力系统智能制造湖南省重点实验室,湖南邵阳422000

出　　处：《材料保护》2020年第10期72-76,共5页Materials Protection

基　　金：湖南省教育厅重点项目(18A384);湖南省教育厅优秀青年项目(18B421)资助。

摘　　要：为了提高铝镍钴永磁体离子镀铜层的致密性,有效克服水溶液作为镀铜电解质时引起的环境污染,以LlCl-AlCl3离子液体实现对铝镍钴的镀铜过程,测试分析了镀层跟基体之间的结合强度变化及其孔隙率影响因素。研究结果表明:采用LlCl-AlCl3离子液体进行电沉积时生成了具有晶体结构的镀层。当摩尔比为1时,离子液体处于还原峰区域形成的峰值电流更大。没有经过活化的镀层形成了明显的团簇状结构,在团簇间产生了许多大尺寸的孔隙。经过活化后在镀层中形成了许多小尺寸的晶粒并呈现致密的组织形态,形成了具有致密结构的镀层,对基体形成全面覆盖的状态。镀层跟铝镍钴基体表面呈现紧密的结合状态,在界面区域并没有产生孔洞结构与缺陷,得到了较为致密的镀层。当厚度提高后,涂层达到了更高的腐蚀电位,孔隙率降低并引起腐蚀电流减小。镀层厚度6.0μm时,腐蚀电位达到了-0.35 V,腐蚀电流发生了显著减小,孔隙率也降低。In order to improve the densification of the permanent magnet copper plating layer,the LlCl-AlCl3 ionic liquid was used to realize the copper plating process of aluminum,nickel and cobalt. The change of bonding strength between coating and substrate and the influencing factors of porosity were tested and analyzed. Results showed that the coating was formed in a crystal structure by electrodeposition of LlCl-AlCl3 ionic liquid. When the molar ratio was 1,the peak current of ionic liquid in the reduction peak region was larger. On the coating without the activation,the obvious cluster-like structure formed,and many large-sized pores were generated between the clusters. After activation,many small size grains and dense microstructure formed in the coating,and the coating with dense structure formed and the substrate was completely covered. The coating was closely combined with the surface of Al Ni Co matrix,and there were no holes and defects in the interface area. When the thickness increased,the coating presented a higher corrosion potential,and the porosity decreased,which led to the decreased corrosion current. When the coating thickness was 6.0 μm,the corrosion potential reached-0.35 V,and the corrosion current decreased significantly as well as the porosity decreased accordingly.

关 键 词：离子液体 铝镍钴 电沉积铜层 阳极活化 孔隙率 

分 类 号：TQ153.1[化学工程—电化学工业]