光催化净化功能石膏的制备技术研究  

Preparation technology of photocatalytic purification functional gypsum

作　　者：茹晓红[1] 王玉江[1] 李旭亮 李世杰 李庆 RU Xiaohong;WANG Yujiang;LI Xuliang;LI Shijie;LI Qing(School of Materials Science and Engineering,Luoyang Institute of Science and Technology,Luoyang 471023,China)

机构地区：[1]洛阳理工学院材料科学与工程学院,河南洛阳471023

出　　处：《新型建筑材料》2021年第1期48-51,共4页New Building Materials

基　　金：“十三五”国家重点研发计划项目(2016YFC0700901);河南省科技发展计划项目(182102311009)。

摘　　要：研究了无机石膏界面改性剂组分对石膏强度及吸水率的影响及作用机理,并通过探寻基体组分、表面改性及光催化液用量参数,制备出高甲醛降解率的光催化净化石膏。结果表明:通过5%改性组分B制备的硫酸铝类改性剂ASB可以在石膏基体表面形成密实的疏水薄膜,从而提高石膏强度,降低其吸水率;对混合石膏基体按照0.03 g/cm^2的量进行涂覆处理后,表面负载0.04 g/cm^2的纳米二氧化钛光催化液,可以制备出6 h甲醛吸附降解率达72.23%的光催化净化功能石膏。The influence and mechanism of the components of inorganic gypsum interface modifier on the strength and water absorption of gypsum were studied.The photocatalytic purified gypsum with high formaldehyde degradation rate was prepared by exploring the parameters of matrix components,surface modification and photocatalytic solution amount.The results show that the interface modifier ASB prepared by 5%modification component B can form a dense hydrophobic film on the surface of gypsum matrix,so as to improve the strength of gypsum and reduce its water absorption.After the mixed gypsum matrix was coated with 0.03 g/cm^2 and loaded with 0.04 g/cm^2 nano-TiO2 photocatalytic solution,the photocatalytic purification gypsum with the degradation rate of 72.23%for formaldehyde adsorption in 6 h could be prepared.

关 键 词：光催化净化石膏 石膏基体 界面改性 甲醛降解 

分 类 号：TU526[建筑科学—建筑技术科学]