Helium-ion-beam nanofabrication: extreme processes and applications  

作　　者：Shixuan He Rong Tian Wei Wu Wen-Di Li Deqiang Wang 

机构地区：[1]Chongqing Key Laboratory of Multi-scale Manufacturing Technology,Chongqing Institute of Green and Intelligent Technology,Chinese Academy of Sciences,Chongqing 400714,People’s Republic of China [2]College of Physics,Sichuan University,Chengdu,Sichuan 610065,People’s Republic of China [3]Department of Electrical Engineering,University of Southern California,Los Angeles,CA 90089,United States of America [4]Department of Mechanical Engineering,The University of Hong Kong,Pokfulam,Hong Kong,People’s Republic of China

出　　处：《International Journal of Extreme Manufacturing》2021年第1期1-23,共23页极端制造（英文）

基　　金：supported by research funding from Natural Science Foundation of Chongqing,China(Grant No.cstc2018jcyjAX0310,cstc2017jcyjB0105,cstc2018jcyjAX0304);National Natural Science Foundation of China(Grant Nos.61701474,31800711);Instrument development program of CAS(YZ201568);Pioneer Hundred Talents Program of CAS(Liang Wang)and Youth Innovation Promotion Association of the Chinese Academy of Sciences(2017392).

摘　　要：Helium ion beam(HIB)technology plays an important role in the extreme fields of nanofabrication.This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication.HIB-based nanofabrication includes direct-write milling,ion beam-induced deposition,and direct-write lithography without resist assistance.HIB nanoscale applications have also been evaluated in the areas of integrated circuits,materials sciences,nano-optics,and biological sciences.This review covers four thematic applications of HIB:(1)helium ion microscopy imaging for biological samples and semiconductors;(2)HIB milling and swelling for 2D/3D nanopore fabrication;(3)HIB-induced deposition for nanopillars,nanowires,and 3D nanostructures;(4)additional HIB direct writing for resist,graphene,and plasmonic nanostructures.This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.

关 键 词：helium ion beam extreme nanofabrication direct writing NANOSTRUCTURES 

分 类 号：TB383.1[一般工业技术—材料科学与工程]