薄膜材料相变温度测量方法介绍  

Introduction of Phase Transition Temperature Measurement Method for Thin Film Materials

作　　者：金森林 李硕 姚雅萱[1] 任玲玲[1] JIN Senlin;LI Shuo;YAO Yaxuan;REN Lingling(National Institute of Metrology,Beijing 100029,China)

机构地区：[1]中国计量科学研究院,北京100029

出　　处：《计量科学与技术》2021年第1期8-13,共6页Metrology Science and Technology

基　　金：中国计量科学研究院基本业务费(AKY1947)。

摘　　要：探究了基于不同原理(变温X射线衍射法、热分析法和光功率分析法)的相变温度的测量方法,并从测量机理上对测温方式进行了分析,最后讨论了不同测量方法的优劣及影响这些测温方法测量精度的因素。有助于揭示薄膜材料相变过程中物理化学性质的变化,为薄膜器件组装过程中的稳定性和质量可控性提供技术支撑。This paper explores the measurement methods of phase transition temperature based on different principles(variable temperature X-ray diffraction method,thermal analysis method,and optical power analysis method),and analyzes the temperature measurement methods in terms of measurement mechanism,and finally discusses the advantages and disadvantages of different measurement methods and the factors affecting the measurement accuracy of these measurement methods.It helps to reveal the changes of physicochemical properties during the phase transition of thin film materials,and provides technical support for the stability and quality controllability during the assembly of thin film devices.

关 键 词：薄膜材料 相变温度 X射线衍射 热分析 光功率 

分 类 号：TB383.2[一般工业技术—材料科学与工程]