杂草对光系统Ⅱ抑制剂的抗药性研究进展  

The Research Progress ofWeeds Resistance to Photosystem Ⅱ Inhibitors

作　　者：龙迪 王彦辉[2] 曾东强[1] Long Di;Wang Yanhui;Zeng Dongqiang(College of Agriculture,Guangxi University,Nanning,530004;Guangxi Key Laboratory of Biology for Crop Diseases and Insect Pests,Plant Protection Research Institute,Guangxi Academy of Agricultural Sciences,Nanning,530007)

机构地区：[1]广西大学农学院,南宁530004 [2]广西壮族自治区农业科学院植物保护研究所,广西作物病虫害生物学重点实验室,南宁530007

出　　处：《分子植物育种》2021年第4期1383-1392,共10页Molecular Plant Breeding

基　　金：国家重点研发计划(2018YFD0201102);国家自然科学基金项目(31460479);广西农科院项目(桂农科2018YM23)共同资助。

摘　　要：随着除草剂使用量和使用频率的不断增加,杂草抗药性问题也逐渐成为杂草防除及治理的难点和热点。目前杂草对PS(Photosystem)Ⅱ抑制剂类除草剂产生抗药性主要分为靶标抗性和非靶标抗性。本研究综述了近年来杂草对PSⅡ抑制剂类除草剂抗药性的产生、发展现状及杂草抗PSⅡ抑制剂类除草剂的机理。针对这些问题,提出除草剂使用过程中需要注意的事项,为延缓杂草对该类除草剂产生抗药性提供一定参考。With the increasing use and frequency of herbicides,the problem of weed resistance has become a difficult and hot issue in weed control and management.At present,the resistance mechanism of weed to PS(Photosystem)Ⅱinhibitors are mainly divided into target resistance and non-target resistance.This study reviews the current status of occurrence,development and resistance mechanism of weed resistance to PSⅡinhibitor in recent years.For these problems,some tips were put forward to the process of herbicide application,and provide some references for delaying the development of weed resistance to this kind of herbicides.

关 键 词：杂草抗药性 光系统Ⅱ抑制剂 抗药性机理 除草剂 

分 类 号：S451[农业科学—植物保护]