基于W@WO_(3)纳米薄膜光催化特性增强研究  

Study on enhanced photocatalytic properties based on W@WO_(3)

作　　者：陈书汉 肖铭涵 许炜航 CHEN Shuhan;XIAO Minghang;XU Weihang(School of Physics and Electronic engineering,Jia Ying University,Meizhou 514015,China)

机构地区：[1]嘉应学院物理与电子工程学院,广东梅州514015

出　　处：《光学技术》2021年第1期62-65,共4页Optical Technique

基　　金：广东省教育厅特色创新类项目(2019KTSCX167)。

摘　　要：采用无催化剂高温反应热蒸发和磁控溅射相结合的方法,在碳布上生长了W@WO_(3)纳米结构薄膜。通过XRD、SEM、XPS测试表明样品结构具有很好的结晶性,且W颗粒吸附在WO_(3)纳米薄膜上构成了欧姆结,可用于提高半导体材料的电荷分离效率。通过将样品放入罗丹明B溶液进行可见光照射5h,76%的RB可被降解,与降解效率为26%的WO_(3)纳米结构相比,经过W修饰后的样品光催化性能可得到大幅提升。实验利用碳布作为衬底生长出大比表面积纳米薄膜,可为了提供更多的光催化反应的活性位点。实验无需采用价格昂贵的贵金属修饰,也无需采用催化剂,可为低成本简易制备高质量的光催化材料提供有效制备方法,在污水等有机物的处理降解领域具有广阔的应用前景。W@WO_(3)Nanostructured films on carbon cloth was grown by the method of high temperature reactive thermal evaporation without catalyst and magnetron sputtering.The results of XRD,SEM and XPS show that the structure of the sample with good crystallinity,and the W particles adsorbed on WO_(3)nano film to form the structure W@WO_(3)Ohmic junction can be used to improve the charge separation efficiency of semiconductor materials.When the sample was exposed to Rhodamine B(RB)solution for 5hours,76%of Rb could be degraded.Compared with WO_(3)nanostructure with 26%degradation efficiency,the photocatalytic performance of the sample film modified by W could be greatly improved.In this experiment,carbon cloth was used as substrate to grow nano films with large specific surface area,which can provide more active sites for photocatalytic reaction.The experiment does not need expensive noble metal modification and catalyst.It can provide an effective preparation method for the preparation of high-quality photocatalytic materials with low cost,and has a broad application prospect in the field of wastewater treatment and degradation.

关 键 词：纳米结构 金属修饰 光催化 

分 类 号：O641[理学—物理化学] O649[理学—化学]