A novel cleanliness control method for disk amplifiers  

作　　者：Yangshuai Li Bingyan Wang Panzheng Zhang Yanli Zhang Yanfeng Zhang Shenlei Zhou Weixin Ma Jianqiang Zhu 

机构地区：[1]Key Laboratory on High Power Laser and Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China [2]Shanghai Institute of Laser Plasma,China Academy of Engineering Physics,Shanghai 201800,China

出　　处：《High Power Laser Science and Engineering》2020年第4期129-133,共5页高功率激光科学与工程（英文版）

基　　金：supported by the Strategic Priority Research Program of the Chinese Academy of Sciences(No.XDA25020101)。

摘　　要：As the key part for energy amplification of high-power laser systems,disk amplifiers must work in an extremely clean environment.Different from the traditional cleanliness control scheme of active intake and passive exhaust(AIPE),a new method of active exhaust and passive intake(AEPI)is proposed in this paper.Combined with computational fluid dynamics(CFD)technology,through the optimization design of the sizes,shapes,and locations of different outlets and inlets,the turbulence that is unfavorable to cleanliness control is effectively avoided in the disk amplifier cavity during the process of AEPI.Finally,the cleanliness control of the cavity of the disk amplifier can be realized just by once exhaust.Meanwhile,the micro negative pressure environment in the amplifier cavity produced during the exhaust process reduces the requirement for sealing.This method is simple,time saving,gas saving,efficient,and safe.It is also suitable for the cleanliness control of similar amplifiers.

关 键 词：active exhaust and passive intake computational fluid dynamics cleanliness control disk amplifier 

分 类 号：TN722[电子电信—电路与系统]