聚丙烯酸酯深紫外光敏树脂的制备及性能研究  

Preparation and Performance Study of Poly-Acrylate UV Photosensitive Resin

作　　者：艾书伦[1,2] 田坤 谭俊玉 汪霞 艾照全 王彩霞[1] AI Shu-lun;TIAN Kun;TAN Jun-yu;WANG Xia;AI Zhao-quan;WANG Cai-xia(College of Chemistry and Chemical Engineering,Hubei University,Wuhan 430062;Wuhan Qiang Lihe New Material Co.LTD,Wuhan 430062)

机构地区：[1]湖北大学化学化工学院 [2]武汉强力荷新材料有限公司,430062

出　　处：《胶体与聚合物》2021年第1期18-20,共3页Chinese Journal of Colloid & Polymer

摘　　要：使用丙烯酸环己酯、丙烯酸-1,7,7-三甲基-双环[2.2.1]-2-庚酯、甲基丙烯酸甲酯和甲基丙烯酸作为反应单体,过氧化苯甲酰作为引发剂,回流聚合后制得聚丙烯酸酯深紫外光敏树脂。研究引发剂用量和聚合时间等反应条件对聚合转化率和产物粘度的影响,同时测定了胶膜硬度及其附着力等性能。Cyclohexyl acrylate,acrylic acid-1,7,7-trimethyl-bicyclo[2.2.1]-2-heptyl ester,methyl methacrylate and methacrylic acid were selected as the reactive monomers,and benzoyl peroxide was used as the initiator.The polyacrylate extreme ultraviolet photosensitive resin is prepared by reflux polymerization.The effects of initiator dosage and polymerization time on polymerization conversion and product viscosity were studied.The hardness and adhesion properties of the film were also determined.

关 键 词：聚丙烯酸树脂 光刻胶 极紫外光固化 芯片 

分 类 号：TQ317.4[化学工程—高聚物工业]